Kinetic Study of the Chemical Vapor Deposition of Tantalum in Long Narrow Channels

2016 ◽  
Vol 3 (14) ◽  
pp. 1500795 ◽  
Author(s):  
James Atwoki Mugabi ◽  
Søren Eriksen ◽  
Irina Petrushina ◽  
Erik Christensen ◽  
Niels J. Bjerrum
Keyword(s):  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Narrow Channels

ChemInform Abstract: Kinetic Study on Chemical Vapor Deposition of Titanium Disulfide Thin Film.

ChemInform ◽  
1989 ◽  
Vol 20 (37) ◽  
Author(s):  
K. KANEHORI ◽  
F. KIRINO ◽  
Y. ITO ◽  
K. MIYAUCHI ◽  
T. KUDO
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Titanium Disulfide

Kinetic Study on Chemical Vapor Deposition of Titanium Disulfide Thin Film

1989 ◽  
Vol 136 (5) ◽  
pp. 1265-1270 ◽  
Author(s):  
Keiichi Kanehori ◽  
Fumiyoshi Kirino ◽  
Yukio Ito ◽  
Katsuki Miyauchi ◽  
Tetsuichi Kudo
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Titanium Disulfide

Laboratory batch reactor method for kinetic study of chemical vapor deposition

AIChE Journal ◽  
1996 ◽  
Vol 42 (4) ◽  
pp. 1108-1115
Author(s):  
Carol M. McConica ◽  
David A. Bell ◽  
Kevin L. Baker ◽  
Devin Moss
Keyword(s):  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Batch Reactor ◽  
Chemical Vapor

Kinetic study of chemical vapor deposition of WSix films from WF6 and SiH2Cl2: Determination of molecular size and reactivity of gas species

2006 ◽  
Vol 513 (1-2) ◽  
pp. 36-42 ◽  
Author(s):  
Takeyasu Saito ◽  
Yukihiro Shimogaki ◽  
Yasuyuki Egashira ◽  
Katsuro Sugawara ◽  
Katsumi Takahiro ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Molecular Size
Sign in / Sign up

Export Citation Format

Share Document