Kinetic study of chemical vapor deposition of WSix films from WF6 and SiH2Cl2: Determination of molecular size and reactivity of gas species

Takeyasu Saito; Yukihiro Shimogaki; Yasuyuki Egashira; Katsuro Sugawara; Katsumi Takahiro; Shinji Nagata; Sadae Yamaguchi; Hiroshi Komiyama

doi:10.1016/j.tsf.2006.01.002

Kinetic study of chemical vapor deposition of WSix films from WF6 and SiH2Cl2: Determination of molecular size and reactivity of gas species

Thin Solid Films ◽

10.1016/j.tsf.2006.01.002 ◽

2006 ◽

Vol 513 (1-2) ◽

pp. 36-42 ◽

Cited By ~ 2

Author(s):

Takeyasu Saito ◽

Yukihiro Shimogaki ◽

Yasuyuki Egashira ◽

Katsuro Sugawara ◽

Katsumi Takahiro ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Kinetic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Molecular Size

Download Full-text

ChemInform Abstract: Kinetic Study on Chemical Vapor Deposition of Titanium Disulfide Thin Film.

ChemInform ◽

10.1002/chin.198937032 ◽

1989 ◽

Vol 20 (37) ◽

Author(s):

K. KANEHORI ◽

F. KIRINO ◽

Y. ITO ◽

K. MIYAUCHI ◽

T. KUDO

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Kinetic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Titanium Disulfide

Download Full-text

Interferometer sensor for determination of plasma enhanced chemical vapor deposition characteristics

Proceedings of the Thirteenth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.99CH36301) ◽

10.1109/ugim.1999.782857 ◽

2003 ◽

Author(s):

D.R. Wirth ◽

L. Caraway ◽

T.J. Sanders

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor

Download Full-text

Persistent photoconductivity on ion irradiated carbon films prepared by plasma assisted chemical vapor deposition and determination of traps in the pseudo‐gap region

Applied Physics Letters ◽

10.1063/1.115590 ◽

1996 ◽

Vol 68 (15) ◽

pp. 2079-2081 ◽

Cited By ~ 1

Author(s):

Somnath Bhattacharyya ◽

K. S. R. Koteswara Rao ◽

S. V. Subramanyam ◽

D. Kanjilal

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Persistent Photoconductivity

Download Full-text

Kinetic Study on Chemical Vapor Deposition of Titanium Disulfide Thin Film

Journal of The Electrochemical Society ◽

10.1149/1.2096903 ◽

1989 ◽

Vol 136 (5) ◽

pp. 1265-1270 ◽

Cited By ~ 12

Author(s):

Keiichi Kanehori ◽

Fumiyoshi Kirino ◽

Yukio Ito ◽

Katsuki Miyauchi ◽

Tetsuichi Kudo

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Kinetic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Titanium Disulfide

Download Full-text

Kinetic Study of the Chemical Vapor Deposition of Tantalum in Long Narrow Channels

Advanced Materials Interfaces ◽

10.1002/admi.201500795 ◽

2016 ◽

Vol 3 (14) ◽

pp. 1500795 ◽

Cited By ~ 3

Author(s):

James Atwoki Mugabi ◽

Søren Eriksen ◽

Irina Petrushina ◽

Erik Christensen ◽

Niels J. Bjerrum

Keyword(s):

Chemical Vapor Deposition ◽

Kinetic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Narrow Channels

Download Full-text

A novel 3D porous graphene foam prepared by chemical vapor deposition using nickel nanoparticles: Electrochemical determination of levodopa in the presence of uric acid

Microchemical Journal ◽

10.1016/j.microc.2019.02.067 ◽

2019 ◽

Vol 147 ◽

pp. 163-169 ◽

Cited By ~ 7

Author(s):

Zhao Wang ◽

Hong Yan Yue ◽

Ze Min Yu ◽

Shuo Huang ◽

Xin Gao ◽

...

Keyword(s):

Uric Acid ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Nickel Nanoparticles ◽

Chemical Vapor ◽

Electrochemical Determination ◽

Graphene Foam ◽

Porous Graphene

Download Full-text

Materials growth and band offset determination of Al2O3/In0.15Ga0.85Sb/GaSb/GaAs heterostructure grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.4973998 ◽

2017 ◽

Vol 110 (2) ◽

pp. 022102 ◽

Cited By ~ 6

Author(s):

Sa Hoang Huynh ◽

Minh Thien Huu Ha ◽

Huy Binh Do ◽

Tuan Anh Nguyen ◽

Quang Ho Luc ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Band Offset ◽

Metalorganic Chemical

Download Full-text

Laboratory batch reactor method for kinetic study of chemical vapor deposition

AIChE Journal ◽

10.1002/aic.690420422 ◽

1996 ◽

Vol 42 (4) ◽

pp. 1108-1115

Author(s):

Carol M. McConica ◽

David A. Bell ◽

Kevin L. Baker ◽

Devin Moss

Keyword(s):

Chemical Vapor Deposition ◽

Kinetic Study ◽

Vapor Deposition ◽

Batch Reactor ◽

Chemical Vapor

Download Full-text

Experimental determination of electron and hole mean drift distance: Application to chemical vapor deposition diamond

Applied Physics Letters ◽

10.1063/1.1586475 ◽

2003 ◽

Vol 82 (26) ◽

pp. 4723-4725 ◽

Cited By ~ 6

Author(s):

Marco Marinelli ◽

E. Milani ◽

G. Pucella ◽

A. Tucciarone ◽

G. Verona-Rinati ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Experimental Determination ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond

Download Full-text

A kinetic study of the chemical vapor deposition of iron films using iron pentacarbonyl

Langmuir ◽

10.1021/la00054a028 ◽

1991 ◽

Vol 7 (6) ◽

pp. 1188-1191 ◽

Cited By ~ 26

Author(s):

Francisco. Zaera

Keyword(s):

Chemical Vapor Deposition ◽

Kinetic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Iron Pentacarbonyl ◽

Iron Films

Download Full-text