Stabilization of Rocksalt CdSe at Atmospheric Pressures via Pseudomorphic Growth

2013 ◽  
Vol 117 (15) ◽  
pp. 7643-7647 ◽  
Author(s):  
Mohnish Pandey ◽  
Raj Ganesh S. Pala
Keyword(s):  
1996 ◽  
Vol 364 (3) ◽  
pp. 235-241 ◽  
Author(s):  
S. Müller ◽  
B. Schulz ◽  
G. Kostka ◽  
M. Farle ◽  
K. Heinz ◽  
...  
Keyword(s):  

2007 ◽  
Vol 76 (20) ◽  
Author(s):  
V. Martin ◽  
W. Meyer ◽  
C. Giovanardi ◽  
L. Hammer ◽  
K. Heinz ◽  
...  
Keyword(s):  

2004 ◽  
Vol 92 (13) ◽  
Author(s):  
J. Ledieu ◽  
J. T. Hoeft ◽  
D. E. Reid ◽  
J. A. Smerdon ◽  
R. D. Diehl ◽  
...  

Nanoscale ◽  
2019 ◽  
Vol 11 (8) ◽  
pp. 3748-3756
Author(s):  
Ailton J. Garcia Jr. ◽  
Leonarde N. Rodrigues ◽  
Saimon Filipe Covre da Silva ◽  
Sergio L. Morelhão ◽  
Odilon D. D. Couto Jr. ◽  
...  

Overcoming the critical thickness limit in pseudomorphic growth of lattice mismatched heterostructures is a fundamental challenge in heteroepitaxy.


2003 ◽  
Vol 83 (9) ◽  
pp. 1728-1730 ◽  
Author(s):  
M. Kim ◽  
J. K. Furdyna ◽  
M. Dobrowolska ◽  
S. Lee ◽  
M. Cheon ◽  
...  

1987 ◽  
Vol 94 ◽  
Author(s):  
D. Cherns

ABSTRACTThe theory of Frank and van der Merwe (FM) in 1949 showed that a minimum energy criterion could explain the pseudomorphic growth of a deposit on a substrate of different lattice spacing and the subsequent relief of strain by misfit dislocations as the deposit thickness increases. Although the “equilibrium” theory is qualitatively correct, account must be taken of actual dislocation sources, which may be complex, and which may be more or less efficient for misfit relief than predicted by the FM model. Moreover, misfit dislocation sources may determine the morphology of the growing film, the interface topology and even the atomic structure of the deposit/substrate interface. These various roles of misfit dislocations are reviewed here with examples from work on metal/metal, semiconductor/semiconductor and metal/semiconductor systems.


1991 ◽  
Vol 111 (1-4) ◽  
pp. 466-469 ◽  
Author(s):  
Albert Chin ◽  
T.Y. Chang ◽  
A. Ourmazd ◽  
E.M. Monberg ◽  
A.M. Chang ◽  
...  

1996 ◽  
Vol 423 ◽  
Author(s):  
Chinkyo Kim ◽  
I. K. Robinson ◽  
Jaemin Myoung ◽  
Kyuhwan Shim ◽  
Kyekyoon Kim ◽  
...  

AbstractIn some materials, Van der Merwe's equilibrium theory of strain relief is believed to explain the sudden transition from pseudomorphic growth of a thin film to a progressively relaxed state. We show, for the first time for GaN, how an accurate estimate of the critical thickness of a thin film can be extrapolated from suitable measurements of lattice constants as a function of film thickness using synchrotron X-ray. We do this both for an elementary elastic energy function, in which the interactions between the dislocations are ignored, and for a more realistic energy estimate due to Kasper. The method is found to work quantitatively for thin films of GaN on AIN. The critical thickness is determined to be 29 ± 4 Å.


2009 ◽  
Vol 1202 ◽  
Author(s):  
Shawn R. Gibb ◽  
James R. Grandusky ◽  
Yongjie Cui ◽  
Mark C. Mendrick ◽  
Leo J. Schowalter

AbstractLow dislocation density epitaxial layers of AlxGa1-xN can be grown pseudomorphically on c-face AlN substrates prepared from high quality, bulk crystals. Here, we will report on initial characterization results from deep ultraviolet (UV) light emitting diodes (LEDs) which have been fabricated and packaged from these structures. As reported previously, pseudomorphic growth and atomically smooth surfaces can be achieved for a full LED device structure with an emission wavelength between 250 nm and 280 nm.A benefit of pseudomorphic growth is the ability to run the devices at high input powers and current densities. The high aluminum content AlxGa1-xN (x∼70%) epitaxial layer can be doped n-type to obtain sheet resistances < 200 Ohms/sq/μm due to the low dislocation density. Bulk crystal growth allows for the ability to fabricate substrates of both polar and non-polar orientations. Non-polar substrates are of particular interest for nitride growth because they eliminate electric field due to spontaneous polarization and piezoelectric effects which limit device performance. Initial studies of epitaxial growth on non-polar substrates will also be presented.


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