Transition from island formation to pseudomorphic growth in the submonolayer CdSe/ZnSe multilayer system

2003 ◽  
Vol 83 (9) ◽  
pp. 1728-1730 ◽  
Author(s):  
M. Kim ◽  
J. K. Furdyna ◽  
M. Dobrowolska ◽  
S. Lee ◽  
M. Cheon ◽  
...  
Author(s):  
L. Hultman ◽  
C.-H. Choi ◽  
R. Kaspi ◽  
R. Ai ◽  
S.A. Barnett

III-V semiconductor films nucleate by the Stranski-Krastanov (SK) mechanism on Si substrates. Many of the extended defects present in the films are believed to result from the island formation and coalescence stage of SK growth. We have recently shown that low (-30 eV) energy, high flux (4 ions per deposited atom), Ar ion irradiation during nucleation of III-V semiconductors on Si substrates prolongs the 1ayer-by-layer stage of SK nucleation, leading to a decrease in extended defect densities. Furthermore, the epitaxial temperature was reduced by >100°C due to ion irradiation. The effect of ion bombardment on the nucleation mechanism was explained as being due to ion-induced dissociation of three-dimensional islands and ion-enhanced surface diffusion.For the case of InAs grown at 380°C on Si(100) (11% lattice mismatch), where island formation is expected after ≤ 1 monolayer (ML) during molecular beam epitaxy (MBE), in-situ reflection high-energy electron diffraction (RHEED) showed that 28 eV Ar ion irradiation prolonged the layer-by-layer stage of SK nucleation up to 10 ML. Otherion energies maintained layer-by-layer growth to lesser thicknesses. The ion-induced change in nucleation mechanism resulted in smoother surfaces and improved the crystalline perfection of thicker films as shown by transmission electron microscopy and X-ray rocking curve studies.


2012 ◽  
Vol 2 (7) ◽  
pp. 177-180
Author(s):  
G ANIL KUMAR G ANIL KUMAR ◽  
◽  
D VENKATESH D VENKATESH ◽  
KANTE RAMESH

1996 ◽  
Vol 364 (3) ◽  
pp. 235-241 ◽  
Author(s):  
S. Müller ◽  
B. Schulz ◽  
G. Kostka ◽  
M. Farle ◽  
K. Heinz ◽  
...  
Keyword(s):  

1993 ◽  
Vol 307 ◽  
Author(s):  
C. L. Foiles ◽  
R. Loloee ◽  
T. I. Morrison

ABSTRACTCo EXAFS data for these Co/Ag multilayers exhibit no changes in basic form and obey a simple scaling with Co thickness down to 6Å. Over this same thickness range the giant magnetoresistance and the manner in which magnetization approaches saturation change substantially. These results indicate that local structural changes do not play a significant role in altering the magnetic properties of this multilayer system.


1998 ◽  
Vol 64 (2) ◽  
pp. 261-268 ◽  
Author(s):  
A. N. Salanov ◽  
V. N. Bibin ◽  
N. A. Rudina

1992 ◽  
Vol 277 (3) ◽  
pp. L63-L69
Author(s):  
William M. Tong ◽  
Eric J. Snyder ◽  
R. Stanley Williams ◽  
Akihisa Yanase ◽  
Yusaburo Segawa ◽  
...  

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