Comparative Study of Titanium Dioxide Atomic Layer Deposition on Silicon Dioxide and Hydrogen-Terminated Silicon

2010 ◽  
Vol 114 (23) ◽  
pp. 10498-10504 ◽  
Author(s):  
Rungthiwa Methaapanon ◽  
Stacey F. Bent
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Comparative Study ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Layer Deposition

Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide

2014 ◽  
Vol 26 (2) ◽  
pp. 024003 ◽  
Author(s):  
Stephan Ratzsch ◽  
Ernst-Bernhard Kley ◽  
Andreas Tünnermann ◽  
Adriana Szeghalmi
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Plasma Parameters ◽  
Layer Deposition

scholarly journals Novel Antimicrobial Titanium Dioxide Nanotubes Obtained through a Combination of Atomic Layer Deposition and Electrospinning Technologies

Nanomaterials ◽  
2018 ◽  
Vol 8 (2) ◽  
pp. 128 ◽  
Author(s):  
Carol López de Dicastillo ◽  
Cristian Patiño ◽  
María Galotto ◽  
Juan Palma ◽  
Daniela Alburquenque ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Titanium Dioxide Nanotubes ◽  
Layer Deposition

scholarly journals Dispersion Characteristics of α-Fe2O3 Nanopowders Coated with Titanium Dioxide by Atomic Layer Deposition

2017 ◽  
Vol 54 (2) ◽  
pp. 137-140 ◽  
Author(s):  
Hae Ryul Ok ◽  
Bo Kyung Lee ◽  
Hye Jin Bae ◽  
Hyug Jong Kim ◽  
Byung Ho Choi
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dispersion Characteristics ◽  
Layer Deposition

scholarly journals In situ XPS analysis of the atomic layer deposition of aluminium oxide on titanium dioxide

2019 ◽  
Vol 21 (3) ◽  
pp. 1393-1398 ◽  
Author(s):  
Robert H. Temperton ◽  
Andrew Gibson ◽  
James N. O'Shea
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Growth Process ◽  
Aluminium Oxide ◽  
Atomic Layer ◽  
Xps Analysis ◽  
Layer Deposition ◽  
Titanium Dioxide Surface ◽  
Rutile Titanium Dioxide

Ultra-thin aluminium oxide was grown on a rutile titanium dioxide surface by atomic layer deposition using trimethylaluminium and water precursors. XPS measurements were made during the growth process at near-ambient pressures.

scholarly journals Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method

AIP Advances ◽  
2019 ◽  
Vol 9 (3) ◽  
pp. 035333 ◽  
Author(s):  
Heungseop Song ◽  
Donghyuk Shin ◽  
Ji-eun Jeong ◽  
Heungsoo Park ◽  
Dae-Hong Ko
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Growth Behavior ◽  
Film Properties ◽  
Feeding Method ◽  
Layer Deposition
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