Metalorganic Chemical Vapor Deposition of Semiconducting III/VI In2Se3 Thin Films from the Single-Source Precursor: In[SeC(SiMe3)3]3

Jinwoo Cheon; John Arnold; Kin-Man Yu; Edith D. Bourret

doi:10.1021/cm00060a014

Metalorganic Chemical Vapor Deposition of Semiconducting III/VI In2Se3 Thin Films from the Single-Source Precursor: In[SeC(SiMe3)3]3

Chemistry of Materials ◽

10.1021/cm00060a014 ◽

1995 ◽

Vol 7 (12) ◽

pp. 2273-2276 ◽

Cited By ~ 31

Author(s):

Jinwoo Cheon ◽

John Arnold ◽

Kin-Man Yu ◽

Edith D. Bourret

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Thin films of CoAs from low‐temperature metalorganic chemical vapor deposition of a novel single‐source precursor compound

Applied Physics Letters ◽

10.1063/1.115455 ◽

1995 ◽

Vol 67 (6) ◽

pp. 822-824 ◽

Cited By ~ 15

Author(s):

Franz‐Robert Klingan ◽

Alexander Miehr ◽

Roland A. Fischer ◽

Wolfgang A. Herrmann

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Ultra-high vacuum metalorganic chemical vapor deposition of GaAs thin films onto Si(100) using a single-source precursor

Thin Solid Films ◽

10.1016/0040-6090(91)90307-j ◽

1991 ◽

Vol 205 (2) ◽

pp. 236-240 ◽

Cited By ~ 4

Author(s):

Jiong-Ping Lu ◽

Rishi Raj ◽

Alex Wernberg

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

High Vacuum ◽

Chemical Vapor ◽

Ultra High Vacuum ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Properties of phase-pure InSe films prepared by metalorganic chemical vapor deposition with a single-source precursor

Journal of Applied Physics ◽

10.1063/1.1561584 ◽

2003 ◽

Vol 93 (8) ◽

pp. 4673-4677 ◽

Cited By ~ 31

Author(s):

In-Hwan Choi ◽

Peter Y. Yu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Phase Pure ◽

Metalorganic Chemical

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Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.108528 ◽

1993 ◽

Vol 62 (9) ◽

pp. 946-948 ◽

Cited By ~ 61

Author(s):

Alex A. Wernberg ◽

Henry J. Gysling ◽

Albert J. Filo ◽

Thomas N. Blanton

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Lithium Niobate ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Organometallic Precursor ◽

Metalorganic Chemical

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Single crystalline growth of LiNbO3 on LiTaO3 by spray metalorganic chemical vapor deposition using the single source precursor LiNb(OEt)6

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90496-0 ◽

1994 ◽

Vol 140 (1-2) ◽

pp. 57-64 ◽

Cited By ~ 13

Author(s):

Alex A. Wernberg ◽

Henry J. Gysling ◽

Gabriel Braunstein

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Crystalline ◽

Single Source Precursor ◽

Metalorganic Chemical ◽

Crystalline Growth

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Effect of Substrates and Thermal Treatments on Metalorganic Chemical Vapor Deposition-Grown Sb2Te3 Thin Films

Crystal Growth & Design ◽

10.1021/acs.cgd.1c00508 ◽

2021 ◽

Author(s):

Martino Rimoldi ◽

Raimondo Cecchini ◽

Claudia Wiemer ◽

Emanuele Longo ◽

Stefano Cecchi ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Thermal Treatments ◽

Metalorganic Chemical

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Cited By ~ 34

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Epitaxial thin films of YBa2Cu3O7−xon LaAlO3substrates deposited by plasma‐enhanced metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.104973 ◽

1991 ◽

Vol 58 (2) ◽

pp. 185-187 ◽

Cited By ~ 36

Author(s):

C. S. Chern ◽

J. Zhao ◽

Y. Q. Li ◽

P. Norris ◽

B. Kear ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Epitaxial Thin Films ◽

Metalorganic Chemical

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Mechanistic study of metalorganic chemical vapor deposition of (Ba,Sr)TiO3 thin films

Journal of Applied Physics ◽

10.1063/1.373005 ◽

2000 ◽

Vol 87 (10) ◽

pp. 7430-7437 ◽

Cited By ~ 13

Author(s):

Y. Gao ◽

C. L. Perkins ◽

S. He ◽

P. Alluri ◽

T. Tran ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Mechanistic Study ◽

Metalorganic Chemical

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