Thin films of CoAs from low‐temperature metalorganic chemical vapor deposition of a novel single‐source precursor compound

Franz‐Robert Klingan; Alexander Miehr; Roland A. Fischer; Wolfgang A. Herrmann

doi:10.1063/1.115455

Thin films of CoAs from low‐temperature metalorganic chemical vapor deposition of a novel single‐source precursor compound

Applied Physics Letters ◽

10.1063/1.115455 ◽

1995 ◽

Vol 67 (6) ◽

pp. 822-824 ◽

Cited By ~ 15

Author(s):

Franz‐Robert Klingan ◽

Alexander Miehr ◽

Roland A. Fischer ◽

Wolfgang A. Herrmann

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Metalorganic Chemical Vapor Deposition of Semiconducting III/VI In2Se3 Thin Films from the Single-Source Precursor: In[SeC(SiMe3)3]3

Chemistry of Materials ◽

10.1021/cm00060a014 ◽

1995 ◽

Vol 7 (12) ◽

pp. 2273-2276 ◽

Cited By ~ 31

Author(s):

Jinwoo Cheon ◽

John Arnold ◽

Kin-Man Yu ◽

Edith D. Bourret

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Ultra-high vacuum metalorganic chemical vapor deposition of GaAs thin films onto Si(100) using a single-source precursor

Thin Solid Films ◽

10.1016/0040-6090(91)90307-j ◽

1991 ◽

Vol 205 (2) ◽

pp. 236-240 ◽

Cited By ~ 4

Author(s):

Jiong-Ping Lu ◽

Rishi Raj ◽

Alex Wernberg

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

High Vacuum ◽

Chemical Vapor ◽

Ultra High Vacuum ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Low Temperature Fabrication Of YBa2Cu3O7−x High-Tc Superconducting Thin Films By Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Science and Technology of Thin Film Superconductors 2 ◽

10.1007/978-1-4684-1345-8_32 ◽

1990 ◽

pp. 217-222

Author(s):

J. Zhao ◽

D. W. Noh ◽

C. S. Chern ◽

Y. Q. Li ◽

P. Norris ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

High Tc ◽

Metalorganic Chemical

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Preparation and characterization of thin films of copper(II) oxide by low temperature normal pressure metalorganic chemical vapor deposition

Materials Research Bulletin ◽

10.1016/0025-5408(89)90128-1 ◽

1989 ◽

Vol 24 (2) ◽

pp. 213-219 ◽

Cited By ~ 15

Author(s):

Angus B. Laurie ◽

Michael L. Norton

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Normal Pressure ◽

Metalorganic Chemical

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Low temperature deposition of Ba1-xSrxTiO3 thin films by ECR plasma-enhanced metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589808202076 ◽

1998 ◽

Vol 21 (1-4) ◽

pp. 355-366 ◽

Cited By ~ 3

Author(s):

S. R. Gilbert ◽

S. R. Summerfelt ◽

T. S. Moise ◽

J. M. Anthony

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Ecr Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Metalorganic Chemical

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Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582390 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1590-1594 ◽

Cited By ~ 4

Author(s):

Jin-Hyo Boo ◽

Cheol Ho Heo ◽

Yong Ki Cho ◽

Jeon-Geon Han

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Temperature Growth ◽

Low Temperature Growth ◽

D2 Steel ◽

Metalorganic Chemical

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Properties of phase-pure InSe films prepared by metalorganic chemical vapor deposition with a single-source precursor

Journal of Applied Physics ◽

10.1063/1.1561584 ◽

2003 ◽

Vol 93 (8) ◽

pp. 4673-4677 ◽

Cited By ~ 31

Author(s):

In-Hwan Choi ◽

Peter Y. Yu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Phase Pure ◽

Metalorganic Chemical

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Direct Preparation of Crystalline SrBi2(Ta1-xNbx)2O9 Thin Films by Thermal Metalorganic Chemical Vapor Deposition at Low Temperature

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.l822 ◽

2000 ◽

Vol 39 (Part 2, No. 8A) ◽

pp. L822-L824 ◽

Cited By ~ 8

Author(s):

Masatoshi Mitsuya ◽

Norimasa Nukaga ◽

Hiroshi Funakubo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Direct Preparation ◽

Metalorganic Chemical

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Titanium Diboride Thin Films by Low-Temperature Chemical Vapor Deposition from the Single Source Precursor Ti(BH4)3(1,2-dimethoxyethane)

Chemistry of Materials ◽

10.1021/cm070277z ◽

2007 ◽

Vol 19 (15) ◽

pp. 3802-3807 ◽

Cited By ~ 29

Author(s):

Navneet Kumar ◽

Yu Yang ◽

Wontae Noh ◽

Gregory S. Girolami ◽

John R. Abelson

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Titanium Diboride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor

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Low temperature growth of oxide thin films by metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589808238765 ◽

1998 ◽

Vol 20 (1-4) ◽

pp. 55-64 ◽

Cited By ~ 1

Author(s):

S. S. Yom

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Temperature Growth ◽

Low Temperature Growth ◽

Metalorganic Chemical

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