Properties of phase-pure InSe films prepared by metalorganic chemical vapor deposition with a single-source precursor

In-Hwan Choi; Peter Y. Yu

doi:10.1063/1.1561584

Properties of phase-pure InSe films prepared by metalorganic chemical vapor deposition with a single-source precursor

Journal of Applied Physics ◽

10.1063/1.1561584 ◽

2003 ◽

Vol 93 (8) ◽

pp. 4673-4677 ◽

Cited By ~ 31

Author(s):

In-Hwan Choi ◽

Peter Y. Yu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Phase Pure ◽

Metalorganic Chemical

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Thin films of CoAs from low‐temperature metalorganic chemical vapor deposition of a novel single‐source precursor compound

Applied Physics Letters ◽

10.1063/1.115455 ◽

1995 ◽

Vol 67 (6) ◽

pp. 822-824 ◽

Cited By ~ 15

Author(s):

Franz‐Robert Klingan ◽

Alexander Miehr ◽

Roland A. Fischer ◽

Wolfgang A. Herrmann

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Metalorganic Chemical Vapor Deposition of Semiconducting III/VI In2Se3 Thin Films from the Single-Source Precursor: In[SeC(SiMe3)3]3

Chemistry of Materials ◽

10.1021/cm00060a014 ◽

1995 ◽

Vol 7 (12) ◽

pp. 2273-2276 ◽

Cited By ~ 31

Author(s):

Jinwoo Cheon ◽

John Arnold ◽

Kin-Man Yu ◽

Edith D. Bourret

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Single crystalline growth of LiNbO3 on LiTaO3 by spray metalorganic chemical vapor deposition using the single source precursor LiNb(OEt)6

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90496-0 ◽

1994 ◽

Vol 140 (1-2) ◽

pp. 57-64 ◽

Cited By ~ 13

Author(s):

Alex A. Wernberg ◽

Henry J. Gysling ◽

Gabriel Braunstein

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Single Crystalline ◽

Single Source Precursor ◽

Metalorganic Chemical ◽

Crystalline Growth

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Ultra-high vacuum metalorganic chemical vapor deposition of GaAs thin films onto Si(100) using a single-source precursor

Thin Solid Films ◽

10.1016/0040-6090(91)90307-j ◽

1991 ◽

Vol 205 (2) ◽

pp. 236-240 ◽

Cited By ~ 4

Author(s):

Jiong-Ping Lu ◽

Rishi Raj ◽

Alex Wernberg

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

High Vacuum ◽

Chemical Vapor ◽

Ultra High Vacuum ◽

Single Source ◽

Single Source Precursor ◽

Metalorganic Chemical

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Deposition of silicon carbide films using a high vacuum metalorganic chemical vapor deposition method with a single source precursor: Study of their structural properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1775191 ◽

2004 ◽

Vol 22 (4) ◽

pp. 2216 ◽

Cited By ~ 8

Author(s):

S. H. Jeong ◽

D. C. Lim ◽

H.-G. Jee ◽

O. M. Moon ◽

C.-K. Jung ◽

...

Keyword(s):

Silicon Carbide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

High Vacuum ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Single Source ◽

Deposition Method ◽

Single Source Precursor ◽

Metalorganic Chemical

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Single source metalorganic chemical vapor deposition of low microwave surface resistance YBa2Cu3O7

Applied Physics Letters ◽

10.1063/1.105400 ◽

1991 ◽

Vol 59 (5) ◽

pp. 606-607 ◽

Cited By ~ 91

Author(s):

R. Hiskes ◽

S. A. DiCarolis ◽

J. L. Young ◽

S. S. Laderman ◽

R. D. Jacowitz ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Surface Resistance ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Microwave Surface Resistance ◽

Metalorganic Chemical

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Epitaxial electro‐optical SrxBa1−xNb2O6 films by single‐source plasma‐enhanced metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.115419 ◽

1995 ◽

Vol 67 (13) ◽

pp. 1836-1838 ◽

Cited By ~ 12

Author(s):

L. D. Zhu ◽

J. Zhao ◽

F. Wang ◽

Peter E. Norris ◽

G. D. Fogarty ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Metalorganic Chemical

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High quality YBa2Cu3O7 films grown on LaAlO3 by single source pulsed metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(98)00128-6 ◽

1998 ◽

Vol 191 (1-2) ◽

pp. 79-83 ◽

Cited By ~ 14

Author(s):

A Abrutis ◽

J.P Sénateur ◽

F Weiss ◽

V Bigelyte ◽

A Teiserskis ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

High Quality ◽

Metalorganic Chemical

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Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.108528 ◽

1993 ◽

Vol 62 (9) ◽

pp. 946-948 ◽

Cited By ~ 61

Author(s):

Alex A. Wernberg ◽

Henry J. Gysling ◽

Albert J. Filo ◽

Thomas N. Blanton

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Lithium Niobate ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Organometallic Precursor ◽

Metalorganic Chemical

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Growth behavior on V-grooved high Miller index GaAs substrates by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00527-3 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 482-488 ◽

Cited By ~ 8

Author(s):

Moo-Sung Kim ◽

Yong Kim ◽

Min-Suk Lee ◽

Young Ju Park ◽

Seong-II Kim ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Growth Behavior ◽

Miller Index ◽

Gaas Substrates ◽

Metalorganic Chemical

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