scholarly journals Ultra-Fast Vertical Ordering of Lamellar Block Copolymer Films on Unmodified Substrates

2021 ◽  
Vol 54 (3) ◽  
pp. 1564-1573
Author(s):  
Maninderjeet Singh ◽  
Wenjie Wu ◽  
Monali N. Basutkar ◽  
Joseph Strzalka ◽  
Abdullah M. Al-Enizi ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Copolymer Films

Morphology Control in Block Copolymer Films Using Mixed Solvent Vapors

ACS Nano ◽  
2012 ◽  
Vol 6 (9) ◽  
pp. 8052-8059 ◽  
Author(s):  
Kevin W. Gotrik ◽  
Adam F. Hannon ◽  
Jeong Gon Son ◽  
Brent Keller ◽  
Alfredo Alexander-Katz ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Mixed Solvent ◽  
Morphology Control ◽  
Copolymer Films ◽  
Solvent Vapors

Symmetry-breaking in double gyroid block copolymer films by non-affine distortion

2021 ◽  
Vol 23 ◽  
pp. 101006
Author(s):  
Seungyun Jo ◽  
Haedong Park ◽  
Taesuk Jun ◽  
Kwangjin Kim ◽  
Hyunsoo Jung ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Symmetry Breaking ◽  
Copolymer Films ◽  
Double Gyroid

Rapid shear alignment of sub-10 nm cylinder-forming block copolymer films based on thermal expansion mismatch

Nano Futures ◽  
2018 ◽  
Vol 1 (3) ◽  
pp. 035006
Author(s):  
Samuel M Nicaise ◽  
Karim R Gadelrab ◽  
Amir Tavakkoli K G ◽  
Caroline A Ross ◽  
Alfredo Alexander-Katz ◽  
...  
Keyword(s):  
Thermal Expansion ◽  
Block Copolymer ◽  
Thermal Expansion Mismatch ◽  
Shear Alignment ◽  
Copolymer Films

Surface Tension of Micellar Block Copolymer Films

2010 ◽  
Vol 57 (6) ◽  
pp. 1412-1415 ◽  
Author(s):  
Hyunjung Kim ◽  
Heeju Lee ◽  
Xiaolong Li ◽  
Zhang Jiang ◽  
Jung-Ran Lim ◽  
...  
Keyword(s):  
Surface Tension ◽  
Block Copolymer ◽  
Copolymer Films

scholarly journals High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers

2020 ◽  
Vol 41 (4) ◽  
pp. 2070008
Author(s):  
Hyun Suk Wang ◽  
Seula Oh ◽  
Junhwan Choi ◽  
Wontae Jang ◽  
Ki Hyun Kim ◽  
...  
Keyword(s):  
Surface Modification ◽  
Block Copolymer ◽  
High Fidelity ◽  
Copolymer Films

scholarly journals Temperature-Controlled Solvent Vapor Annealing of Thin Block Copolymer Films

Polymers ◽  
2019 ◽  
Vol 11 (8) ◽  
pp. 1312 ◽  
Author(s):  
Xiao Cheng ◽  
Alexander Böker ◽  
Larisa Tsarkova
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Thermal Annealing ◽  
Saturated Vapor ◽  
Polymer Chains ◽  
Special Focus ◽  
Solvent Vapor ◽  
Copolymer Films ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Solvent vapor annealing is as an effective and versatile alternative to thermal annealing to equilibrate and control the assembly of polymer chains in thin films. Here, we present scientific and practical aspects of the solvent vapor annealing method, including the discussion of such factors as non-equilibrium conformational states and chain dynamics in thin films in the presence of solvent. Homopolymer and block copolymer films have been used in model studies to evaluate the robustness and the reproducibility of the solvent vapor processing, as well as to assess polymer-solvent interactions under confinement. Advantages of utilizing a well-controlled solvent vapor environment, including practically interesting regimes of weakly saturated vapor leading to poorly swollen states, are discussed. Special focus is given to dual temperature control over the set-up instrumentation and to the potential of solvo-thermal annealing. The evaluated insights into annealing dynamics derived from the studies on block copolymer films can be applied to improve the processing of thin films of crystalline and conjugated polymers as well as polymer composite in confined geometries.

Robust porous polymers enabled by a fast trifluoroacetic acid etch with improved selectivity for polylactide

2017 ◽  
Vol 1 (8) ◽  
pp. 1526-1533 ◽  
Author(s):  
Amrita Sarkar ◽  
Morgan Stefik
Keyword(s):  
Block Copolymer ◽  
Trifluoroacetic Acid ◽  
Selective Etching ◽  
Porous Polymers ◽  
Copolymer Films ◽  
Acid Etch

Faster and more selective etching of polylactides from few-mm thick block copolymer films enabled by trifluoroacetic acid etchant.

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