Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists

1998 ◽  
pp. 126-133 ◽  
Author(s):  
Kieko Harada ◽  
Masahito Kushida ◽  
Kyoichi Saito ◽  
Kazuyuki Sugita ◽  
Hirotada Iida
Keyword(s):  
Diazo Compounds ◽  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Novel photoacid generators for chemically amplified resists

2002 ◽  
Author(s):  
Hitoshi Yamato ◽  
Toshikage Asakura ◽  
Akira Matsumoto ◽  
Masaki Ohwa
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Chemically Amplified Resists Using 1,2‐Naphthoquinone Diazide‐4‐sulfonates as Photoacid Generators

1994 ◽  
Vol 141 (11) ◽  
pp. 3141-3145 ◽  
Author(s):  
Rumiko Hayase ◽  
Yasunobu Onishi ◽  
Hirokazu Niki ◽  
Naohiko Oyasato ◽  
Shuzi Hayase
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists

2003 ◽  
Vol 32 (6) ◽  
pp. 554-555
Author(s):  
Jin-Baek Kim ◽  
Ji-Hyun Jang ◽  
Hyun-Woo Kim ◽  
Sang-Gyun Woo
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists
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