Photoacid generation in chemically amplified resists: elucidation of structural effects of photoacid generators using new acid-sensitive dyes for monitoring acid generation

1998 ◽  
Author(s):  
James F. Cameron ◽  
J. Michael Mori ◽  
Thomas M. Zydowsky ◽  
Doris Kang ◽  
Roger F. Sinta ◽  
...  
Keyword(s):  
Structural Effects ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Novel photoacid generators for chemically amplified resists

2002 ◽  
Author(s):  
Hitoshi Yamato ◽  
Toshikage Asakura ◽  
Akira Matsumoto ◽  
Masaki Ohwa
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Chemically Amplified Resists Using 1,2‐Naphthoquinone Diazide‐4‐sulfonates as Photoacid Generators

1994 ◽  
Vol 141 (11) ◽  
pp. 3141-3145 ◽  
Author(s):  
Rumiko Hayase ◽  
Yasunobu Onishi ◽  
Hirokazu Niki ◽  
Naohiko Oyasato ◽  
Shuzi Hayase
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4301-4306 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists
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