Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique

1999 ◽  
Author(s):  
Bing Lu ◽  
Paul M. Dentinger ◽  
James W. Taylor ◽  
Gilbert D. Feke ◽  
Dan Hessman ◽  
...  
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Novel photoacid generators for chemically amplified resists

2002 ◽  
Author(s):  
Hitoshi Yamato ◽  
Toshikage Asakura ◽  
Akira Matsumoto ◽  
Masaki Ohwa
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Chemically Amplified Resists Using 1,2‐Naphthoquinone Diazide‐4‐sulfonates as Photoacid Generators

1994 ◽  
Vol 141 (11) ◽  
pp. 3141-3145 ◽  
Author(s):  
Rumiko Hayase ◽  
Yasunobu Onishi ◽  
Hirokazu Niki ◽  
Naohiko Oyasato ◽  
Shuzi Hayase
Keyword(s):  
Chemically Amplified ◽  
Photoacid Generators ◽  
Chemically Amplified Resists

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4301-4306 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists

Study of Radiation-Induced Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 2, No. 11A) ◽  
pp. L1574-L1576 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists
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