Optimization of Aerosol Jet Printing for High-Resolution, High-Aspect Ratio Silver Lines

2013 ◽  
Vol 5 (11) ◽  
pp. 4856-4864 ◽  
Author(s):  
Ankit Mahajan ◽  
C. Daniel Frisbie ◽  
Lorraine F. Francis
Keyword(s):  
High Resolution ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Jet Printing ◽  
Aerosol Jet Printing

scholarly journals Aerosol Jet Printing of Silver Lines with A High Aspect Ratio on A Heated Silicon Substrate

Materials ◽  
2020 ◽  
Vol 13 (3) ◽  
pp. 730 ◽  
Author(s):  
Alexey Efimov ◽  
Pavel Arsenov ◽  
Denis Kornyushin ◽  
Anna Lizunova ◽  
Ivan Volkov ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Aspect Ratio ◽  
Substrate Temperature ◽  
High Aspect Ratio ◽  
Silicon Substrate ◽  
Silver Films ◽  
Aspect Ratios ◽  
Jet Printing ◽  
Rate Of Evaporation ◽  
Aerosol Jet Printing

In this work, we studied the formation of conductive silver lines with high aspect ratios (AR = thickness/width) > 0.1 using the modernized method of aerosol jet printing on a heated silicon substrate. The geometric (AR) and electrical (resistivity) parameters of the formed lines were investigated depending on the number of printing layers (1–10 layers) and the temperature of the substrate (25–300 °C). The AR of the lines increased as the number of printing layers and the temperature of the substrate increased. An increase in the AR of the lines with increasing substrate temperature was associated with a decrease in the ink spreading as a result of an increase in the rate of evaporation of nano-ink. Moreover, with an increase in the substrate temperature of more than 200 °C, a significant increase in the porosity of the formed lines was observed, and as a result, the electrical resistivity of the lines increased significantly. Taking into account the revealed regularities, it was demonstrated that the formation of silver lines with a high AR > 0.1 and a low electrical resistivity of 2–3 μΩ∙cm is advisable to be carried out at a substrate temperature of about 100 °C. The adhesion strength of silver films formed on a heated silicon substrate is 2.8 ± 0.9 N/mm2, which further confirms the suitability of the investigated method of aerosol jet printing for electronic applications.

scholarly journals Fabrication of Metallic Lines by Aerosol Jet Printing: Study of the Effect of Substrate Temperature on the Aspect Ratio

2018 ◽  
Vol 34 (6) ◽  
pp. 2777-2781 ◽  
Author(s):  
Alexey Anatolevich Efimov ◽  
Pavel Vladimirovich Arsenov ◽  
Kirill Nikolaevich Minkov ◽  
Victor Vladimirovich Ivanov
Keyword(s):  
Aspect Ratio ◽  
Substrate Temperature ◽  
High Aspect Ratio ◽  
High Density ◽  
Heated Substrate ◽  
Jet Printing ◽  
Aerosol Jet Printing

In this paper we investigated the effect of substrate temperature (25-300 °C) on the aspect ratio (thickness/width) of the silver lines formed by aerosol jet printing (AJP). This effect was studied by varying the speed of substrate (50-250 mm/min) and the number of printing layers (1-25 layers) in order to obtain lines with high aspect ratio. It is shown that AJP on a heated substrate at a temperature equal to >100 °C allows to increase the aspect ratio of the lines more than 17 times in comparison with conventional AJP. It is established that the aspect ratio of the lines increases with the increase in the number of printing layers and the decrease in the speed of substrate. Silver lines with high aspect ratio of 1.7 with a width of about 25 μm were formed. This result is important for the formation of current-carrying microcircuits with a high density of elements.

scholarly journals High-resolution particle separation by inertial focusing in high aspect ratio curved microfluidics

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Javier Cruz ◽  
Klas Hjort
Keyword(s):  
High Resolution ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Biological Fluids ◽  
Essential Feature ◽  
Particle Separation ◽  
Size Difference ◽  
Inertial Focusing ◽  
Complex Samples ◽  
Wide Range

AbstractThe ability to focus, separate and concentrate specific targets in a fluid is essential for the analysis of complex samples such as biological fluids, where a myriad of different particles may be present. Inertial focusing is a very promising technology for such tasks, and specially a recently presented variant, inertial focusing in High Aspect Ratio Curved systems (HARC systems), where the systems are easily engineered and focus the targets together in a stable position over a wide range of particle sizes and flow rates. However, although convenient for laser interrogation and concentration, by focusing all particles together, HARC systems lose an essential feature of inertial focusing: the possibility of particle separation by size. Within this work, we report that HARC systems not only do have the capacity to separate particles but can do so with extremely high resolution, which we demonstrate for particles with a size difference down to 80 nm. In addition to the concept for particle separation, a model considering the main flow, the secondary flow and a simplified expression for the lift force in HARC microchannels was developed and proven accurate for the prediction of the performance of the systems. The concept was also demonstrated experimentally with three different sub-micron particles (0.79, 0.92 and 1.0 µm in diameter) in silicon-glass microchannels, where the resolution in the separation could be modulated by the radius of the channel. With the capacity to focus sub-micron particles and to separate them with high resolution, we believe that inertial focusing in HARC systems is a technology with the potential to facilitate the analysis of complex fluid samples containing bioparticles like bacteria, viruses or eukaryotic organelles.

Analysis and characterization of high-resolution and high-aspect-ratio imaging fiber bundles

2015 ◽  
Vol 54 (32) ◽  
pp. 9422 ◽  
Author(s):  
Nojan Motamedi ◽  
Salman Karbasi ◽  
Joseph E. Ford ◽  
Vitaliy Lomakin
Keyword(s):  
High Resolution ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Fiber Bundles ◽  
Ratio Imaging

scholarly journals High-resolution, high-aspect-ratio iridium–nickel composite nanoimprint molds

2016 ◽  
Vol 34 (6) ◽  
pp. 061804 ◽  
Author(s):  
Chang-Sheng Lee ◽  
Yeong-Yuh Lee ◽  
Karen S. L. Chong ◽  
Li Wang ◽  
Christian Dais ◽  
...  
Keyword(s):  
High Resolution ◽  
Aspect Ratio ◽  
High Aspect Ratio
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