Stabilization of Polyoxometalate Water Oxidation Catalysts on Hematite by Atomic Layer Deposition

2017 ◽  
Vol 9 (40) ◽  
pp. 35048-35056 ◽  
Author(s):  
Sarah M. Lauinger ◽  
Brandon D. Piercy ◽  
Wei Li ◽  
Qiushi Yin ◽  
Daniel L. Collins-Wildman ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Oxidation Catalysts ◽  
Layer Deposition

scholarly journals Correction: Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2on fluorine-doped tin oxide nanoparticle films

Nanoscale ◽  
2015 ◽  
Vol 7 (28) ◽  
pp. 12226-12226 ◽  
Author(s):  
Isvar A. Cordova ◽  
Qing Peng ◽  
Isa L. Ferrall ◽  
Adam J. Rieth ◽  
Paul G. Hoertz ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Nanoparticle Films ◽  
Layer Deposition ◽  
Oxide Nanoparticle ◽  
Photoelectrochemical Water Oxidation

Conformal SnOx heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones

2020 ◽  
Vol 8 (18) ◽  
pp. 9292-9301
Author(s):  
Ivan A. Moreno-Hernandez ◽  
Sisir Yalamanchili ◽  
Harold J. Fu ◽  
Harry A. Atwater ◽  
Bruce S. Brunschwig ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxide Layer ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Surface Recombination ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Photoelectrochemical Water Oxidation

A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.

Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

2016 ◽  
Vol 52 (57) ◽  
pp. 8806-8809 ◽  
Author(s):  
Peng Zhang ◽  
Tuo Wang ◽  
Jinlong Gong
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Surface States ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Photoelectrochemical Water Oxidation

This paper describes the fabrication of TiO2 overlayers by atomic layer deposition to passivate the surface states on Ta3N5 thin film anodes for photoelectrochemical water oxidation.

scholarly journals Synthesis, characterization, and water oxidation by a molecular chromophore-catalyst assembly prepared by atomic layer deposition. The “mummy” strategy

2015 ◽  
Vol 6 (11) ◽  
pp. 6398-6406 ◽  
Author(s):  
A. M. Lapides ◽  
B. D. Sherman ◽  
M. K. Brennaman ◽  
C. J. Dares ◽  
K. R. Skinner ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Covalent Bonds ◽  
Layer Deposition ◽  
Bilayer Formation

A Ru(ii)-polypyridyl chromophore-catalyst assembly for light-assisted water oxidation is constructed using atomic layer deposition with no covalent bonds between molecules required for bilayer formation.

Metal–Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions To Enable Electrocatalytic Water Oxidation

2015 ◽  
Vol 7 (51) ◽  
pp. 28223-28230 ◽  
Author(s):  
Chung-Wei Kung ◽  
Joseph E. Mondloch ◽  
Timothy C. Wang ◽  
Wojciech Bury ◽  
William Hoffeditz ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Cobalt Ions ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

scholarly journals 570 mV photovoltage, stabilized n-Si/CoOxheterojunction photoanodes fabricated using atomic layer deposition

2016 ◽  
Vol 9 (3) ◽  
pp. 892-897 ◽  
Author(s):  
Xinghao Zhou ◽  
Rui Liu ◽  
Ke Sun ◽  
Kimberly M. Papadantonakis ◽  
Bruce S. Brunschwig ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
High Performance ◽  
Atomic Layer ◽  
Layer Deposition

Deposition of a 50 nm thick CoOxlayer on planar n-Si yields stable, high-performance photoanodes for water oxidation.

scholarly journals Chromophore-Catalyst Assembly for Water Oxidation Prepared by Atomic Layer Deposition

2017 ◽  
Vol 9 (44) ◽  
pp. 39018-39026 ◽  
Author(s):  
Leila Alibabaei ◽  
Robert J. Dillon ◽  
Caroline E. Reilly ◽  
M. Kyle Brennaman ◽  
Kyung-Ryang Wee ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition of Metastable β-Fe2O3 via Isomorphic Epitaxy for Photoassisted Water Oxidation

2014 ◽  
Vol 6 (24) ◽  
pp. 21894-21900 ◽  
Author(s):  
Jonathan D. Emery ◽  
Christian M. Schlepütz ◽  
Peijun Guo ◽  
Shannon C. Riha ◽  
Robert P. H. Chang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Layer Deposition
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