Suppression of hydrogen-ion drift into underlying layers using plasma deposited silicon oxynitride film during high-density plasma chemical vapor deposition

2007 ◽  
Vol 515 (12) ◽  
pp. 4966-4970 ◽  
Author(s):  
T. Murata ◽  
T. Yamaguchi ◽  
M. Sawada ◽  
S. Shimizu ◽  
K. Asai ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silicon Oxynitride ◽  
Hydrogen Ion ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Ion Drift ◽  
Oxynitride Film ◽  
Density Plasma

Hydrogen Ion Drift into Underlying Oxides by RF Bias during High-Density Plasma Chemical Vapor Deposition

2005 ◽  
Vol 44 (11) ◽  
pp. 7863-7868 ◽  
Author(s):  
Tadashi Yamaguchi ◽  
Mahito Sawada ◽  
Koyu Asai ◽  
Kiyoteru Kobayashi ◽  
Masahiro Yoneda
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Density ◽  
Hydrogen Ion ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Ion Drift ◽  
Density Plasma

Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

2002 ◽  
Vol 41 (Part 1, No. 4A) ◽  
pp. 1974-1980 ◽  
Author(s):  
Shigeru Kinoshita ◽  
Shigeyuki Takagi ◽  
Hidehiko Yabuhara ◽  
Hiroshi Nishimura ◽  
Hideichi Kawaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Calibration Method ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Deposition Simulation ◽  
Density Plasma
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