High-performance polycrystalline silicon thin-film transistors with oxide–nitride–oxide gate dielectric and multiple nanowire channels

Shih-Ching Chen; Ting-Chang Chang; Po-Tsun Liu; Y.C. Wu; C.C. Tsai; T.S. Chang; Chen-Hsin Lien

doi:10.1016/j.tsf.2006.07.093

High-performance polycrystalline silicon thin-film transistors with oxide–nitride–oxide gate dielectric and multiple nanowire channels

Thin Solid Films ◽

10.1016/j.tsf.2006.07.093 ◽

2006 ◽

Vol 515 (3) ◽

pp. 1112-1116

Author(s):

Shih-Ching Chen ◽

Ting-Chang Chang ◽

Po-Tsun Liu ◽

Y.C. Wu ◽

C.C. Tsai ◽

...

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Gate Dielectric ◽

Silicon Thin Film ◽

Nitride Oxide

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High-performance polycrystalline silicon thin-film transistors integrating sputtered aluminum-oxide gate dielectric with bridged-grain active channel

Semiconductor Science and Technology ◽

10.1088/0268-1242/28/11/115003 ◽

2013 ◽

Vol 28 (11) ◽

pp. 115003 ◽

Cited By ~ 7

Author(s):

Meng Zhang ◽

Wei Zhou ◽

Rongsheng Chen ◽

Man Wong ◽

Hoi-Sing Kwok

Keyword(s):

Thin Film ◽

Aluminum Oxide ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Gate Dielectric ◽

Silicon Thin Film ◽

Active Channel

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High-performance CF4 plasma treated polycrystalline silicon thin-film transistors using a high-k Tb2O3 gate dielectric

Applied Physics Letters ◽

10.1063/1.3357428 ◽

2010 ◽

Vol 96 (11) ◽

pp. 113504 ◽

Cited By ~ 7

Author(s):

Tung-Ming Pan ◽

Zhi-Hong Li

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Gate Dielectric ◽

Silicon Thin Film ◽

High K

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Reliability and Memory Characteristics of Sequential Laterally Solidified Low Temperature Polycrystalline Silicon Thin Film Transistors with an Oxide–Nitride–Oxide Stack Gate Dielectric

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3154 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3154-3158 ◽

Cited By ~ 2

Author(s):

Szu-I Hsieh ◽

Hung-Tse Chen ◽

Yu-Cheng Chen ◽

Chi-Lin Chen ◽

Jia-Xing Lin ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Gate Dielectric ◽

Silicon Thin Film ◽

Nitride Oxide ◽

Memory Characteristics

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High-performance polycrystalline silicon thin-film transistors prepared via the laser crystallization of the prepatterned channel layer on the bottom-gate structure

Thin Solid Films ◽

10.1016/j.tsf.2012.09.048 ◽

2013 ◽

Vol 529 ◽

pp. 421-425 ◽

Cited By ~ 4

Author(s):

Chao-Lung Wang ◽

I-Che Lee ◽

Chun-Yu Wu ◽

Yu-Ting Cheng ◽

Po-Yu Yang ◽

...

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Laser Crystallization ◽

Silicon Thin Film ◽

Channel Layer ◽

Gate Structure ◽

Bottom Gate

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High-performance vertically stacked bottom-gate and top-gate polycrystalline silicon thin-film transistors for three-dimensional integrated circuits

Solid-State Electronics ◽

10.1016/j.sse.2012.05.016 ◽

2012 ◽

Vol 77 ◽

pp. 26-30 ◽

Cited By ~ 3

Author(s):

I-Che Lee ◽

Tsung-Che Tsai ◽

Chun-Chien Tsai ◽

Po-Yu Yang ◽

Chao-Lung Wang ◽

...

Keyword(s):

Thin Film ◽

Integrated Circuits ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Three Dimensional ◽

Silicon Thin Film ◽

Bottom Gate

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Characterization of Polycrystalline Silicon Thin-Film Transistors with Nickel-Titanium Oxide Gate Dielectric Coating by Sol-Gel Method

10.7567/ssdm.2009.p-9-2 ◽

2009 ◽

Cited By ~ 1

Author(s):

S. C. Wu ◽

R. C. Yen ◽

C. K. Deng ◽

T. S. Chao ◽

S. H. Chuang ◽

...

Keyword(s):

Thin Film ◽

Titanium Oxide ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Gate Dielectric ◽

Sol Gel ◽

Nickel Titanium ◽

Silicon Thin Film ◽

Gel Method

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SiO2formation by thermal evaporation of SiO in oxygen atmosphere used to fabrication of high performance polycrystalline silicon thin film transistors

Applied Physics Letters ◽

10.1063/1.110956 ◽

1994 ◽

Vol 64 (8) ◽

pp. 1018-1020 ◽

Cited By ~ 32

Author(s):

T. Sameshima ◽

A. Kohno ◽

M. Sekiya ◽

M. Hara ◽

N. Sano

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Thermal Evaporation ◽

Oxygen Atmosphere ◽

Silicon Thin Film

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Development of high-performance polycrystalline silicon thin-film transistors (TFTs) using defect control process technologies

IEEE Electron Device Letters ◽

10.1109/led.2002.1015218 ◽

2002 ◽

Vol 23 (7) ◽

pp. 407-409 ◽

Cited By ~ 6

Author(s):

S. Higashi ◽

D. Abe ◽

Y. Hiroshima ◽

K. Miyashita ◽

T. Kawamura ◽

...

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Control Process ◽

Silicon Thin Film ◽

Defect Control

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High-Performance Bottom-Gate Poly-Si Polysilicon–Oxide–Nitride–Oxide–Silicon Thin Film Transistors Crystallized by Excimer Laser Irradiation for Two-Bit Nonvolatile Memory Applications

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2012.6245 ◽

2012 ◽

Vol 12 (7) ◽

pp. 5318-5324 ◽

Cited By ~ 1

Author(s):

I-Che Lee ◽

Hsu-Hang Kuo ◽

Chun-Chien Tsai ◽

Chao-Lung Wang ◽

Po-Yu Yang ◽

...

Keyword(s):

Thin Film ◽

Laser Irradiation ◽

Thin Film Transistors ◽

Nonvolatile Memory ◽

High Performance ◽

Silicon Thin Film ◽

Excimer Laser Irradiation ◽

Memory Applications ◽

Nitride Oxide ◽

Bottom Gate

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High-Performance Polycrystalline Silicon Thin Film Transistors on Non-Alkali Glass Produced Using Continuous Wave Laser Lateral Crystallization

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.l311 ◽

2002 ◽

Vol 41 (Part 2, No. 3B) ◽

pp. L311-L313 ◽

Cited By ~ 86

Author(s):

Akito Hara ◽

Fumiyo Takeuchi ◽

Michiko Takei ◽

Katsuyuki Suga ◽

Kenichi Yoshino ◽

...

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Continuous Wave ◽

Continuous Wave Laser ◽

Silicon Thin Film ◽

Alkali Glass ◽

Wave Laser ◽

Lateral Crystallization

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