High-Performance Bottom-Gate Poly-Si Polysilicon–Oxide–Nitride–Oxide–Silicon Thin Film Transistors Crystallized by Excimer Laser Irradiation for Two-Bit Nonvolatile Memory Applications
2012 ◽
Vol 12
(7)
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pp. 5318-5324
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2007 ◽
Vol 28
(7)
◽
pp. 599-602
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2007 ◽
Vol 46
(10A)
◽
pp. 6525-6529
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2005 ◽
Vol 8
(1)
◽
pp. G14
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Keyword(s):
Keyword(s):
1993 ◽
Vol 76
(12)
◽
pp. 40-47
Keyword(s):