An infrared study of the surface chemistry of titanium nitride atomic layer deposition on silica from TiCl4 and NH3

Mark Q. Snyder; Benjamin A. McCool; Joseph DiCarlo; Carl P. Tripp; William J. DeSisto

doi:10.1016/j.tsf.2006.03.013

An infrared study of the surface chemistry of titanium nitride atomic layer deposition on silica from TiCl4 and NH3

Thin Solid Films ◽

10.1016/j.tsf.2006.03.013 ◽

2006 ◽

Vol 514 (1-2) ◽

pp. 97-102 ◽

Cited By ~ 18

Author(s):

Mark Q. Snyder ◽

Benjamin A. McCool ◽

Joseph DiCarlo ◽

Carl P. Tripp ◽

William J. DeSisto

Keyword(s):

Atomic Layer Deposition ◽

Surface Chemistry ◽

Titanium Nitride ◽

Atomic Layer ◽

Infrared Study ◽

Layer Deposition

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Tertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride

AIP Advances ◽

10.1063/5.0031127 ◽

2021 ◽

Vol 11 (1) ◽

pp. 015218

Author(s):

Changbong Yeon ◽

Jaesun Jung ◽

Hyeran Byun ◽

Kok Chew Tan ◽

Taeho Song ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Atomic Layer ◽

Alkyl Halides ◽

Layer Deposition ◽

Tertiary Alkyl

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Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications

ACS Applied Electronic Materials ◽

10.1021/acsaelm.0c01079 ◽

2021 ◽

Vol 3 (2) ◽

pp. 999-1005

Author(s):

Hyeok Jae Lee ◽

Jin Ha Hwang ◽

Ji-Yong Park ◽

Sang Woon Lee

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Titanium Nitride ◽

Surface Reaction ◽

Atomic Layer ◽

Reaction Route ◽

Layer Deposition

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Analysis of TiO2 Atomic Layer Deposition Surface Chemistry and Evidence of Propene Oligomerization Using Surface-Enhanced Raman Spectroscopy

Journal of the American Chemical Society ◽

10.1021/jacs.8b10689 ◽

2018 ◽

Vol 141 (1) ◽

pp. 414-422 ◽

Cited By ~ 12

Author(s):

Ryan A. Hackler ◽

Gyeongwon Kang ◽

George C. Schatz ◽

Peter C. Stair ◽

Richard P. Van Duyne

Keyword(s):

Raman Spectroscopy ◽

Atomic Layer Deposition ◽

Surface Chemistry ◽

Atomic Layer ◽

Surface Enhanced Raman Spectroscopy ◽

Deposition Surface ◽

Layer Deposition ◽

Surface Enhanced ◽

Surface Enhanced Raman

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Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5057761 ◽

2018 ◽

Vol 36 (6) ◽

pp. 06A105 ◽

Cited By ~ 8

Author(s):

Igor Krylov ◽

Xianbin Xu ◽

Ekaterina Zoubenko ◽

Kamira Weinfeld ◽

Santiago Boyeras ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Atomic Layer ◽

Structure And Properties ◽

Layer Deposition ◽

Reactive Gas

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Role of oligomer structures in the surface chemistry of amidinate metal complexes used for atomic layer deposition of thin films

Journal of Materials Research ◽

10.1557/jmr.2019.293 ◽

2019 ◽

Vol 35 (7) ◽

pp. 720-731 ◽

Cited By ~ 2

Author(s):

Jonathan Guerrero-Sánchez ◽

Bo Chen ◽

Noboru Takeuchi ◽

Francisco Zaera

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Surface Chemistry ◽

Metal Complexes ◽

Atomic Layer ◽

Layer Deposition ◽

Image Position

Abstract

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Stabilization of Low Valent Zirconium Nitrides in Titanium Nitride via Plasma-Enhanced Atomic Layer Deposition and Assessment of Electrochemical Properties

ACS Applied Energy Materials ◽

10.1021/acsaem.0c00428 ◽

2020 ◽

Vol 3 (6) ◽

pp. 5095-5100

Author(s):

Hyunho Noh ◽

Nari Jeon ◽

Alex B. F. Martinson ◽

Joseph T. Hupp

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Electrochemical Properties ◽

Atomic Layer ◽

Zirconium Nitrides ◽

Layer Deposition ◽

Low Valent

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Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma

Applied Surface Science ◽

10.1016/j.apsusc.2020.148482 ◽

2020 ◽

pp. 148482

Author(s):

Byunguk Kim ◽

Namgue Lee ◽

Junghoon Lee ◽

Taehun Park ◽

Hyunwoo Park ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Atomic Layer ◽

Nitride Film ◽

Remote Plasma ◽

Organic Precursor ◽

Layer Deposition ◽

Metal Organic ◽

Titanium Nitride Film ◽

N2 Plasma

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Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1821585 ◽

2005 ◽

Vol 23 (1) ◽

pp. 118-125 ◽

Cited By ~ 57

Author(s):

J. D. Ferguson ◽

A. W. Weimer ◽

S. M. George

Keyword(s):

Atomic Layer Deposition ◽

Surface Chemistry ◽

Atomic Layer ◽

Layer Deposition ◽

Absorbance Changes

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In Situ Gas-Phase Diagnostics for Titanium Nitride Atomic Layer Deposition

ECS Meeting Abstracts ◽

10.1149/ma2011-02/26/1852 ◽

2011 ◽

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Gas Phase ◽

Atomic Layer ◽

Layer Deposition

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Atomic layer deposition of ultra-trace Pt catalysts onto a titanium nitride nanowire array for electrocatalytic methanol oxidation

Chemical Communications ◽

10.1039/c9cc06370f ◽

2019 ◽

Vol 55 (88) ◽

pp. 13283-13286 ◽

Cited By ~ 1

Author(s):

Junwei Sun ◽

Xin Wang ◽

Yanyan Song ◽

Qianqian Wang ◽

Yumei Song ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Methanol Oxidation ◽

Current Density ◽

Nanowire Array ◽

Three Dimensional ◽

Atomic Layer ◽

Pt Catalysts ◽

Layer Deposition ◽

Ultra Trace

Atomic layer deposition of ultra-trace Pt onto three-dimensional titanium nitride nanowire array was realized, and the obtained catalyst shows a much larger mass current density than commercial Pt/C towards electrocatalytic methanol oxidation.

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