Atomic layer deposition of ultra-trace Pt catalysts onto a titanium nitride nanowire array for electrocatalytic methanol oxidation

Junwei Sun; Xin Wang; Yanyan Song; Qianqian Wang; Yumei Song; Ding Yuan; Lixue Zhang

doi:10.1039/c9cc06370f

Atomic layer deposition of ultra-trace Pt catalysts onto a titanium nitride nanowire array for electrocatalytic methanol oxidation

Chemical Communications ◽

10.1039/c9cc06370f ◽

2019 ◽

Vol 55 (88) ◽

pp. 13283-13286 ◽

Cited By ~ 1

Author(s):

Junwei Sun ◽

Xin Wang ◽

Yanyan Song ◽

Qianqian Wang ◽

Yumei Song ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Methanol Oxidation ◽

Current Density ◽

Nanowire Array ◽

Three Dimensional ◽

Atomic Layer ◽

Pt Catalysts ◽

Layer Deposition ◽

Ultra Trace

Atomic layer deposition of ultra-trace Pt onto three-dimensional titanium nitride nanowire array was realized, and the obtained catalyst shows a much larger mass current density than commercial Pt/C towards electrocatalytic methanol oxidation.

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Tertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride

AIP Advances ◽

10.1063/5.0031127 ◽

2021 ◽

Vol 11 (1) ◽

pp. 015218

Author(s):

Changbong Yeon ◽

Jaesun Jung ◽

Hyeran Byun ◽

Kok Chew Tan ◽

Taeho Song ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Atomic Layer ◽

Alkyl Halides ◽

Layer Deposition ◽

Tertiary Alkyl

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Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications

ACS Applied Electronic Materials ◽

10.1021/acsaelm.0c01079 ◽

2021 ◽

Vol 3 (2) ◽

pp. 999-1005

Author(s):

Hyeok Jae Lee ◽

Jin Ha Hwang ◽

Ji-Yong Park ◽

Sang Woon Lee

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Titanium Nitride ◽

Surface Reaction ◽

Atomic Layer ◽

Reaction Route ◽

Layer Deposition

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Atomic Layer Deposition of NiO on Self‐supported Co 3 O 4 Nanoneedle Array for Electrocatalytic Methanol Oxidation Reaction

Energy Technology ◽

10.1002/ente.202100112 ◽

2021 ◽

Author(s):

Jia Cheng ◽

Yanyan Song ◽

Mengxiao Sun ◽

Jiankun Sun ◽

Lixue Zhang

Keyword(s):

Atomic Layer Deposition ◽

Methanol Oxidation ◽

Oxidation Reaction ◽

Atomic Layer ◽

Methanol Oxidation Reaction ◽

Layer Deposition ◽

Nanoneedle Array

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Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5057761 ◽

2018 ◽

Vol 36 (6) ◽

pp. 06A105 ◽

Cited By ~ 8

Author(s):

Igor Krylov ◽

Xianbin Xu ◽

Ekaterina Zoubenko ◽

Kamira Weinfeld ◽

Santiago Boyeras ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Atomic Layer ◽

Structure And Properties ◽

Layer Deposition ◽

Reactive Gas

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Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate.

Superconductor Science and Technology ◽

10.1088/1361-6668/ac0d09 ◽

2021 ◽

Author(s):

Maksim Viktorovich Shibalov ◽

Alexander Mumlyakov ◽

Igor Trofimov ◽

Ekaterina Timofeeva ◽

Anna Sirotina ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Critical Current Density ◽

Critical Current ◽

Current Density ◽

Atomic Layer ◽

Deposition Process ◽

High Critical Current Density ◽

Atomic Layer Deposition Process ◽

Layer Deposition ◽

Amorphous Substrate

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Stabilization of Low Valent Zirconium Nitrides in Titanium Nitride via Plasma-Enhanced Atomic Layer Deposition and Assessment of Electrochemical Properties

ACS Applied Energy Materials ◽

10.1021/acsaem.0c00428 ◽

2020 ◽

Vol 3 (6) ◽

pp. 5095-5100

Author(s):

Hyunho Noh ◽

Nari Jeon ◽

Alex B. F. Martinson ◽

Joseph T. Hupp

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Electrochemical Properties ◽

Atomic Layer ◽

Zirconium Nitrides ◽

Layer Deposition ◽

Low Valent

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Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma

Applied Surface Science ◽

10.1016/j.apsusc.2020.148482 ◽

2020 ◽

pp. 148482

Author(s):

Byunguk Kim ◽

Namgue Lee ◽

Junghoon Lee ◽

Taehun Park ◽

Hyunwoo Park ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Atomic Layer ◽

Nitride Film ◽

Remote Plasma ◽

Organic Precursor ◽

Layer Deposition ◽

Metal Organic ◽

Titanium Nitride Film ◽

N2 Plasma

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In Situ Gas-Phase Diagnostics for Titanium Nitride Atomic Layer Deposition

ECS Meeting Abstracts ◽

10.1149/ma2011-02/26/1852 ◽

2011 ◽

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Gas Phase ◽

Atomic Layer ◽

Layer Deposition

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Three-Dimensional Amorphous TiO2 Thin-Film Electrodes Deposited on Micro-Pillars By Spatial Atomic Layer Deposition for Li+-Ion Batteries

ECS Meeting Abstracts ◽

10.1149/ma2016-02/1/128 ◽

2016 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Tio2 Thin Film ◽

Three Dimensional ◽

Atomic Layer ◽

Li Ion Batteries ◽

Layer Deposition ◽

Amorphous Tio2 ◽

Li Ion ◽

Micro Pillars

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Atomic Layer Deposition of TiN below 600 K Using N2H4

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.282.232 ◽

2018 ◽

Vol 282 ◽

pp. 232-237

Author(s):

Adam Hinckley ◽

Anthony Muscat

Keyword(s):

Growth Rate ◽

Atomic Layer Deposition ◽

Titanium Nitride ◽

Photoelectron Spectroscopy ◽

Film Growth ◽

Detection Limits ◽

Atomic Layer ◽

Volatile Species ◽

X Ray ◽

Layer Deposition

Atomic layer deposition (ALD) was used to grow titanium nitride (TiN) on SiO2with TiCl4and N2H4. X-ray photoelectron spectroscopy (XPS) and ellipsometry were used to characterize film growth. A hydrogen-terminated Si (Si-H) surface was used as a reference to understand the reaction steps on SPM cleaned SiO2. The growth rate of TiN at 573 K doubled on Si-H compared to SiO2because of the formation of Si-N bonds. When the temperature was raised to 623 K, O transferred from Ti to Si to form Si-N when exposed to N2H4. Oxygen and Ti could be removed at 623 K by TiCl4producing volatile species. The added surface reactions reduce the Cl in the film below detection limits.

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