Effect of high-temperature annealing on the structural and optical properties of ZnO films

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The structure and properties of HfO2 films deposited by plasma assisted reactive pulsed laser deposition and annealed in N2 were studied upon thermal annealing as well as the evaluation of thermal stability by Fourier transform infrared spectroscopy, spectroscopic ellipsometry, and optical transmission measurements. The as-deposited HfO2 films appear predominantly monoclinic with an amorphous matrix which becomes crystallized after high-temperature annealing. No interfacial SiOx is observed for the as-deposited films on Si. The deposited HfO2 films exhibit good thermal stability and show excellent transparency in a wide spectral range with optical band gap energies of 5.65–5.73 eV depending on annealing temperature. An improvement in the optical properties by high-temperature annealing is also observed.


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Vol 47 (5) ◽  
pp. 601-606 ◽  
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Oleksandr Dobrozhan ◽  
Denys Kurbatov ◽  
Anatoliy Opanasyuk ◽  
Hyeonsik Cheong ◽  
Andreu Cabot

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