scholarly journals Low-frequency noise assessment in advanced UTBOX SOI nMOSFETs with different gate dielectrics

2014 ◽  
Vol 97 ◽  
pp. 14-22 ◽  
Author(s):  
S.D. dos Santos ◽  
B. Cretu ◽  
V. Strobel ◽  
J.-M. Routoure ◽  
R. Carin ◽  
...  
Keyword(s):  
Gate Dielectrics ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Noise Assessment

scholarly journals Low-Frequency Noise Assessment of Work Function Engineering Cap Layers in High-k Gate Stacks

2019 ◽  
Vol 8 (2) ◽  
pp. N25-N31 ◽  
Author(s):  
C. Claeys ◽  
R. Ritzenthaler ◽  
T. Schram ◽  
H. Arimura ◽  
N. Horiguchi ◽  
...  
Keyword(s):  
Work Function ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Gate Stacks ◽  
High K ◽  
Noise Assessment

Comparative study of drain and gate low-frequency noise in nMOSFETs with hafnium-based gate dielectrics

2006 ◽  
Vol 53 (4) ◽  
pp. 823-828 ◽  
Author(s):  
Gino Giusi ◽  
F. Crupi ◽  
C. Pace ◽  
C. Ciofi ◽  
G. Groeseneken
Keyword(s):  
Comparative Study ◽  
Gate Dielectrics ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise

Low-Frequency Noise Assessment of the Oxide Trap Density in Thick-Oxide Input-Output Transistors for DRAM Applications

2016 ◽  
Vol 5 (6) ◽  
pp. N27-N31 ◽  
Author(s):  
E. Simoen ◽  
R. Ritzenthaler ◽  
M.-J. Cho ◽  
T. Schram ◽  
N. Horiguchi ◽  
...  
Keyword(s):  
Low Frequency ◽  
Trap Density ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Input Output ◽  
Noise Assessment ◽  
Oxide Trap

Low-frequency noise in Si0.7Ge0.3 surface channel pMOSFETs with ALD HfO2/Al2O3 gate dielectrics

2004 ◽  
Vol 48 (12) ◽  
pp. 2271-2275 ◽  
Author(s):  
M. von Haartman ◽  
D. Wu ◽  
B.G. Malm ◽  
P.-E. Hellström ◽  
S.-L. Zhang ◽  
...  
Keyword(s):  
Gate Dielectrics ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise

Low-Frequency Noise Assessment of Vertically Stacked Si n-Channel Nanosheet FETs With Different Metal Gates

2020 ◽  
Vol 67 (11) ◽  
pp. 4802-4807
Author(s):  
Alberto Oliveira ◽  
Anabela Veloso ◽  
Cor Claeys ◽  
Naoto Horiguchi ◽  
Eddy Simoen
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gates ◽  
Noise Assessment

The Effect of Auditory Processing on the Development of Low Level Low Frequency Noise Criteria

1982 ◽  
Vol 1 (3) ◽  
pp. 97-108 ◽  
Author(s):  
S. Benton ◽  
H.G. Leventhall
Keyword(s):  
Auditory System ◽  
Auditory Processing ◽  
Low Frequency ◽  
Frequency Noise ◽  
Assessment Practices ◽  
Low Frequency Noise ◽  
Low Level ◽  
Noise Assessment ◽  
The Individual ◽  
External Stimuli

The role played by loudness in the assessment of annoyance is seen to effect an intensity dominated concept current in noise assessment practices. Such dominance is not supported by the complex processing nature of the auditory system. The individual is placed within a context which requires the auditory system to align the person to external stimuli whilst maintaining the production of appropriate behaviours. Development of the concepts associated with audition is a pre-requisite to establishing viable noise assessment criteria. The limitations of present day criteria, with an accepted assumption of intensity as the key parameter, are accentuated when assessments are made of low level low frequency noise. Once the individual is viewed as an active processor, bodily parameters may also serve to provide indices which are derived from the amount of ‘processor work’.

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