Metal–insulator transition temperature of boron-doped VO2 thin films grown by reactive pulsed laser deposition

2020 ◽  
Vol 177 ◽  
pp. 32-37 ◽  
Author(s):  
Thameur Hajlaoui ◽  
Nicolas Émond ◽  
Christian Quirouette ◽  
Boris Le Drogoff ◽  
Joëlle Margot ◽  
...  
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Bruno Berini ◽  
Maxime Evain ◽  
Arnaud Fouchet ◽  
Yves Dumont ◽  
Elena Popova ◽  
...  

AIP Advances ◽  
2019 ◽  
Vol 9 (1) ◽  
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H. Kim ◽  
N. A. Charipar ◽  
J. Figueroa ◽  
N. S. Bingham ◽  
A. Piqué

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Vol 113 (4) ◽  
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Kai Liu ◽  
Tao Tao ◽  
Kelvin Lo ◽  
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Ultrathin Sm0.6Nd0.4NiO3−δepitaxial films were deposited by pulsed laser deposition (PLD) onto LaAlO3(LAO) single crystal substrates. TheTMIof the SNNO films remarkably decreases with the decrease of the growth oxygen pressure, while the strain state varied slightly.


2013 ◽  
Vol 113 (17) ◽  
pp. 173704 ◽  
Author(s):  
B. L. Brown ◽  
Mark Lee ◽  
P. G. Clem ◽  
C. D. Nordquist ◽  
T. S. Jordan ◽  
...  

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