scholarly journals Influence of Nitrogen Partial Pressure and Substrate Bias on the Mechanical Properties of VN Coatings

2012 ◽  
Vol 36 ◽  
pp. 217-225 ◽  
Author(s):  
Yuexiu Qiu ◽  
Sam Zhang ◽  
Bo Li ◽  
Jyh-Wei Lee ◽  
Dongliang Zhao
Keyword(s):  
Mechanical Properties ◽  
Partial Pressure ◽  
Substrate Bias ◽  
Nitrogen Partial Pressure

Structure and bonding studies of the C:N thin films produced by rf sputtering method

1990 ◽  
Vol 5 (11) ◽  
pp. 2490-2496 ◽  
Author(s):  
C. J. Torng ◽  
J. M. Sivertsen ◽  
J. H. Judy ◽  
C. Chang
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Partial Pressure ◽  
Energy Gap ◽  
Rf Sputtering ◽  
Nitrogen Plasma ◽  
Systematic Variation ◽  
Nitrogen Partial Pressure ◽  
Graphite Target ◽  
Structure And Bonding

Thin C:N films were prepared by rf diode sputtering of a graphite target in a mixed argon/nitrogen plasma. We have observed a systematic variation of the properties of these C:N films with an increase in the nitrogen partial pressure. XPS, AES, and TEM studies show that nitrogen will stabilize the diamond sp3 bonding. From XPS studies, we found that the density of our C:N films is increased from 1.37 × 1023 atoms/cm3 to 1.63 × 1023 atoms/cm3 using a 100% nitrogen plasma. The energy gap of our nitrogen carbon also shows an increase from 1.1 eV to 1.4 eV using a 100% nitrogen plasma. The mechanical properties also are shown to be enhanced for certain applications. By using the same method, we can also show that it can produce 100% amorphous C:N films which are more diamond-like as compared with other methods.

Deposition of CrN Coatings by Filtered Cathodic Vacuum Arc

2008 ◽  
Vol 373-374 ◽  
pp. 130-133 ◽  
Author(s):  
Ji Liang Mo ◽  
Min Hao Zhu ◽  
J. An ◽  
H. Sun ◽  
Yong Xiang Leng ◽  
...  
Keyword(s):  
Partial Pressure ◽  
Bias Voltage ◽  
Vacuum Arc ◽  
Substrate Bias ◽  
Nitrogen Partial Pressure ◽  
Substrate Bias Voltage ◽  
Crn Coating ◽  
Deposition Parameters ◽  
Filtered Cathodic Vacuum Arc ◽  
Crn Coatings

CrN coatings were deposited on cemented carbide substrates by filtered cathodic vacuum arc technique (FCVA). The effect of different deposition parameters: nitrogen partial pressure, substrate-bias voltage and preheating of the substrate, on the structural and mechanical properties of the coating was investigated. X-ray diffraction analysis was used to determine the structure and composition of the coatings. The tribological behaviour and wear properties of the coatings against Si3N4 ball at different normal loads were studied under reciprocating sliding condition. The results showed that a smooth and dense CrN coating with good properties can be obtained provided a pure Cr interlayer was pre-deposited. The optimal deposition parameters were the nitrogen partial pressure of 0.1 Pa, substrate-bias voltage of -100 V. Preheating of the substrate was no good for improving the properties of the coating. The FCVA CrN coating showed high hardness and good wear resistance, which was probably attributed to its smooth surface and dense microstructure. The wear mechanism of the CrN coating was a combination of abrasion and oxidation. However, the coating flaked off at high normal load due to the deficient adhesion strength of the coating to the substrate.

Structural and Mechanical Properties of Ti-W-N Thin Films by Dual Unbalanced Magnetron Sputtering

2015 ◽  
Vol 1131 ◽  
pp. 246-250 ◽  
Author(s):  
Pattira Homhuan ◽  
Jiraporn Pongsopa ◽  
Kanchaya Honglertkongsakul
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Partial Pressure ◽  
Photoelectron Spectroscopy ◽  
Nitrogen Partial Pressure ◽  
X Ray ◽  
Pressure Chemical ◽  
Aisi D2 ◽  
Steel Substrates

Ti-W-N thin films grown on Si (100) and AISI D2 steel substrates had been deposited by a d.c. magnetron sputtering with pure Ti and W targets in a mixture of Ar and N2 plasma. The nitrogen partial pressure was varied from 0% to 9% of total gas. All Ti-W-N films were formed in solid solution with determination by x-ray diffractrogram analysis. A strong preferred orientation TiN(111) was detected. Their mechanical properties were studied using nanoindentation with Berkovich tip. An increase in hardness was observed with increasing nitrogen partial pressure. The optimum protective coating for plastic deformation was Ti-W-N film grown at 9% nitrogen partial pressure. Chemical bonding of Ti-W-N films was investigated by x-ray photoelectron spectroscopy. Binding energy analysis showed that N was mainly in TiN and W2N. The corrosion behavior was studied in variation of nitrogen partial pressure. Ti-W-N films deposited on steel at low nitrogen partial pressure showed excellent corrosion resistance in NaCl solution.

A Mechanical Study of W and W2N Single Layers, and W2N/W Multilayers

2003 ◽  
Vol 778 ◽  
Author(s):  
L. Maillé ◽  
C. Sant ◽  
P. Aubert ◽  
P. Garnier
Keyword(s):  
Mechanical Properties ◽  
Partial Pressure ◽  
N Deposition ◽  
Nitrogen Partial Pressure ◽  
Layer Spacing ◽  
Partial Pressures ◽  
Mechanical Study

AbstractThe microstructure of W, W2N single layers and W2N/W multilayers are related to their mechanical properties. We study the hardness of multilayers as function of the period thickness. Two partial pressures of nitride (PN2 = 10 % and 50 %) for W2N deposition are investigated. For the single layers, the hardness value increases with the nitrogen partial pressure. The hardness of W2N/W multilayers using PN2 = 50% for W2N deposition increases when the layer spacing decreased. A hardness value of 19.5 GPa is reached for a multilayer with PN2 = 50% and, close to 20 GPa with PN2 = 10% for all the period studied.

Effect of nitrogen partial pressure on the structure, physical and mechanical properties of CrB2 and Cr–B–N films

2009 ◽  
Vol 517 (8) ◽  
pp. 2675-2680 ◽  
Author(s):  
Ph. V. Kiryukhantsev-Korneev ◽  
J.F. Pierson ◽  
M.I. Petrzhik ◽  
M. Alnot ◽  
E.A. Levashov ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Partial Pressure ◽  
Physical And Mechanical Properties ◽  
Nitrogen Partial Pressure

scholarly journals Effects of Nitrogen Partial Pressure on the Properties of Al-Cr-N Films Prepared by DC Reactive Sputtering

2004 ◽  
Vol 55 (4) ◽  
pp. 271-275
Author(s):  
Yukio IDE ◽  
Satoshi NAKAMURA ◽  
Akihiro NINO ◽  
Katsuhiko KISHITAKE
Keyword(s):  
Partial Pressure ◽  
Reactive Sputtering ◽  
Nitrogen Partial Pressure
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