Ferroelectric random access memory based on one-transistor–one-capacitor structure for flexible electronics

2013 ◽  
Vol 14 (2) ◽  
pp. 505-510 ◽  
Author(s):  
D. Mao ◽  
I. Mejia ◽  
A.L. Salas-Villasenor ◽  
M. Singh ◽  
H. Stiegler ◽  
...  
2004 ◽  
Vol 43 (4B) ◽  
pp. 2199-2202
Author(s):  
Hyun-Ho Kim ◽  
Jung-Hoon Park ◽  
Yoon-Jong Song ◽  
Nak-Won Jang ◽  
Heung-Jin Joo ◽  
...  

2004 ◽  
Vol 449-452 ◽  
pp. 353-356
Author(s):  
Hyoun Woo Kim

The usage of barium strontium titanate (BST) capacitor have recently been considered in the fabrication of dynamic random access memory (DRAM) device. In this study, in order to avoid the difficulties of high aspect ratio etching of bottom electrode in the conventional stack-typecapacitor structure, we suggest to introduce a concave-type capacitor structure. The fabrication procedure of the two kinds of the concave capacitor cells, Pt/BST/Pt and Ru/BST/Ru are explained. We have studied on the metal electrode etching in the concave structure and have discussed the patterning issues in fabricating the capacitor structures.


2018 ◽  
Vol 65 (8) ◽  
pp. 1708-1714 ◽  
Author(s):  
A. L. Bosser ◽  
V. Gupta ◽  
A. Javanainen ◽  
G. Tsiligiannis ◽  
S. D. LaLumondiere ◽  
...  

2020 ◽  
Vol 26 (S2) ◽  
pp. 1404-1405
Author(s):  
Sahar Hihath ◽  
Hannah Harter ◽  
Jerry Fortier ◽  
David Flowers

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