High-quality ultrathin chemical-vapor-deposited Ta2O5 capacitors prepared by high-density plasma annealing

2004 ◽  
Vol 106 (3) ◽  
pp. 234-241 ◽  
Author(s):  
C.H Liu ◽  
S.J Chang ◽  
J.F Chen ◽  
S.C Chen ◽  
J.S Lee ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
High Density ◽  
High Quality ◽  
Chemical Vapor Deposited ◽  
Plasma Annealing ◽  
Density Plasma

Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

2002 ◽  
Vol 41 (Part 1, No. 4A) ◽  
pp. 1974-1980 ◽  
Author(s):  
Shigeru Kinoshita ◽  
Shigeyuki Takagi ◽  
Hidehiko Yabuhara ◽  
Hiroshi Nishimura ◽  
Hideichi Kawaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Calibration Method ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Deposition Simulation ◽  
Density Plasma

High-quality graphene transfer via directional etching of metal substrates

Nanoscale ◽  
2019 ◽  
Vol 11 (34) ◽  
pp. 16001-16006 ◽  
Author(s):  
Xuewei Zhang ◽  
Zehao Wu ◽  
Haoran Zheng ◽  
Qiancheng Ren ◽  
Zhenxing Zou ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
High Quality ◽  
Metal Substrates ◽  
Cu Substrate ◽  
Chemical Vapor Deposited ◽  
Graphene Transfer

The quality of chemical-vapor-deposited graphene can be significantly improved by directional removal of the underlying Cu substrate.

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