Ionizing radiation damage in 65 nm CMOS technology: Influence of geometry, bias and temperature at ultra-high doses
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2001 ◽
Vol 48
(4)
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pp. 1561-1564
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2001 ◽
Vol 98
(9)
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pp. 5240-5245
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2012 ◽
Vol 6
(1)
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pp. 8-13
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