Influence of the SiO2 layer thickness on the degradation of HfO2/SiO2 stacks subjected to static and dynamic stress conditions

2007 ◽  
Vol 47 (4-5) ◽  
pp. 544-547 ◽  
Author(s):  
E. Amat ◽  
R. Rodríguez ◽  
M. Nafría ◽  
X. Aymerich ◽  
J.H. Stathis
2004 ◽  
Vol 85 (25) ◽  
pp. 6227-6229 ◽  
Author(s):  
Wataru Mizubayashi ◽  
Naoki Yasuda ◽  
Hirokazu Hisamatsu ◽  
Kunihiko Iwamoto ◽  
Koji Tominaga ◽  
...  

2010 ◽  
Vol 518 (8) ◽  
pp. 2163-2166 ◽  
Author(s):  
B. Ma ◽  
C.L. Zha ◽  
Z.Z. Zhang ◽  
Q.Y. Jin

2013 ◽  
Vol 270 ◽  
pp. 712-717 ◽  
Author(s):  
J. Shen ◽  
Z.Q. Li ◽  
Y.R. Chen ◽  
X.H. Chen ◽  
Y.W. Chen ◽  
...  

1993 ◽  
Author(s):  
Irith Gilath ◽  
S. Eliezer ◽  
T. Bar-Noy ◽  
R. Englman ◽  
Z. Jaeger

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