Influence of the SiO2 layer thickness on the degradation of HfO2/SiO2 stacks subjected to static and dynamic stress conditions
2007 ◽
Vol 47
(4-5)
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pp. 544-547
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1993 ◽
Vol 74
(1-2)
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pp. 197-203
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2013 ◽
Vol 270
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pp. 712-717
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2014 ◽
Vol 25
(12)
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pp. 5560-5569
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2003 ◽
Vol 50
(10)
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pp. 1377-1382
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