High aspect ratio silicon and polyimide nanopillars by combination of nanosphere lithography and intermediate mask pattern transfer
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2017 ◽
Vol 35
(5)
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pp. 051205
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2004 ◽
Vol 22
(6)
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pp. 2764
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2011 ◽
Vol 29
(6)
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pp. 06FC15
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2019 ◽
Vol 1410
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pp. 012093
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2019 ◽
Vol 7
(29)
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pp. 8803-8812
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2013 ◽
Vol 26
(1)
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pp. 97-103
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2019 ◽
Vol 58
(SE)
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pp. SE0802
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