Effects of Ar ion bombardment by unbalanced magnetron sputtering on mechanical and thermal properties of Ti-Cu-Zr-Ni-Hf-Si thin film metallic glass

Materials & Design ◽

10.1016/j.matdes.2016.09.005 ◽

2016 ◽

Vol 111 ◽

pp. 271-278 ◽

Cited By ~ 6

Author(s):

Junpei Kobata ◽

Ken-ichi Miura

Keyword(s):

Thin Film ◽

Thermal Properties ◽

Metallic Glass ◽

Magnetron Sputtering ◽

Ion Bombardment ◽

Mechanical And Thermal Properties ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Si Thin Film

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Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.12.969 ◽

2014 ◽

Vol 52 (12) ◽

pp. 969-974

Author(s):

Young Joon Baik ◽

Kyung Eun Bae ◽

Jong Keuk Park ◽

Wook Seong Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Boron Carbide ◽

Deposition Behavior ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

Materials Science Forum ◽

10.4028/www.scientific.net/msf.102-104.563 ◽

1992 ◽

Vol 102-104 ◽

pp. 563-572 ◽

Cited By ~ 1

Author(s):

S.L. Rohde

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics

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Deposition of YBCO thin film with buffer layer by unbalanced magnetron sputtering

10.1117/12.300667 ◽

1998 ◽

Author(s):

Chunaeni Latief ◽

M. Barmawi

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Buffer Layer ◽

Ybco Thin Film ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Nanoimprinting of Ti–Cu-based thin-film metallic glasses deposited by unbalanced magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.11.174 ◽

2017 ◽

Vol 707 ◽

pp. 132-136 ◽

Cited By ~ 4

Author(s):

Junpei Kobata ◽

Ken-ichi Miura ◽

Kenji Amiya ◽

Yasuyuki Fukuda ◽

Yasunori Saotome

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Metallic Glasses ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Characteristics of Al Doped ZnO Films Prepared on Polyethylene Terephthalate Substrate by Unbalanced Magnetron Sputtering Method for Organic Thin Film Transistors

Science of Advanced Materials ◽

10.1166/sam.2015.2095 ◽

2015 ◽

Vol 7 (1) ◽

pp. 151-156

Author(s):

Jaehyeong Lee ◽

Yong Seob Park

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Transistors ◽

Organic Thin Film Transistors ◽

Zno Films ◽

Organic Thin Film ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Doped Zno ◽

Polyethylene Terephthalate Substrate

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Effect of ion bombardment and substrate orientation on structure and properties of titanium nitride films deposited by unbalanced magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1460888 ◽

2002 ◽

Vol 20 (3) ◽

pp. 678-682 ◽

Cited By ~ 13

Author(s):

S. Guruvenket ◽

G. Mohan Rao

Keyword(s):

Magnetron Sputtering ◽

Titanium Nitride ◽

Ion Bombardment ◽

Structure And Properties ◽

Substrate Orientation ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Insertion of nanocrystalline diamond film and the addition of hydrogen gas during deposition for adhesion improvement of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

Thin Solid Films ◽

10.1016/j.tsf.2013.02.058 ◽

2013 ◽

Vol 534 ◽

pp. 380-383 ◽

Cited By ~ 1

Author(s):

J.-S. Ko ◽

J.-K. Park ◽

W.-S. Lee ◽

J.-Y. Huh ◽

Y.-J. Baik

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Diamond Film ◽

Cubic Boron Nitride ◽

Hydrogen Gas ◽

Nanocrystalline Diamond ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Double unbalanced magnetron sputtering system used for ion-assisted thin film deposition

Vacuum ◽

10.1016/s0042-207x(98)00144-4 ◽

1998 ◽

Vol 51 (2) ◽

pp. 119-126 ◽

Cited By ~ 4

Author(s):

S Groudeva-Zotova

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Enhancement of mechanical and thermal properties in Zr–Cu–Ni–Al–N thin film metallic glass by compositional control of nitrogen

Materials Letters ◽

10.1016/j.matlet.2015.07.019 ◽

2015 ◽

Vol 159 ◽

pp. 369-372 ◽

Cited By ~ 7

Author(s):

Joseph Lee ◽

Huan-Chien Tung ◽

Jenq-Gong Duh

Keyword(s):

Thin Film ◽

Thermal Properties ◽

Metallic Glass ◽

Mechanical And Thermal Properties ◽

Compositional Control

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Nanocolumnar Composite Microstructure of Superhard SiC Thin Film Deposited Using Unbalanced Magnetron Sputtering Method

Advanced Engineering Materials ◽

10.1002/adem.201600008 ◽

2016 ◽

Vol 18 (7) ◽

pp. 1123-1126 ◽

Cited By ~ 3

Author(s):

K.-E. Bae ◽

K.-W. Chae ◽

J.-K. Park ◽

W.-S. Lee ◽

Y.-J. Baik

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Composite Microstructure

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