Effect of nitrogen flow rate on the structure and mechanical properties of ZrN thin films on Si(100) and stainless steel substrates

2007 ◽  
Vol 102 (1) ◽  
pp. 31-38 ◽  
Author(s):  
Jia-Hong Huang ◽  
Chi-Hsin Ho ◽  
Ge-Ping Yu
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Stainless Steel ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Steel Substrates

scholarly journals Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films

2019 ◽  
Vol 42 (5) ◽  
Author(s):  
Dhruva Kumar ◽  
Ranjan Kr Ghadai ◽  
Soham Das ◽  
Ashis Sharma ◽  
Bibhu P Swain
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Sicn Thin Films

Nanoindentation and Microstructural Evolution Studies of DC Magnetron Sputtered Chromium Nitride Thin Films

2001 ◽  
Vol 672 ◽  
Author(s):  
A.B. Agarwal ◽  
B.A. Rainey ◽  
S.M. Yalisove ◽  
J.C. Bilello
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Elastic Modulus ◽  
Flow Rate ◽  
Chromium Nitride ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Flow Rates ◽  
Chromium Nitrides ◽  
Deposited Films

ABSTRACTNanoindentation experiments have been performed to assess the mechanical behavior of chromium nitride (CrxNy) thin films sputtered in different deposition geometries and with varying Ar and N2 pressures. The hardness and elastic modulus of chromium nitrides are of great interest with regard to their applications. In the present work, two different deposition geometries, i.e. multi-substrate and confocal, were used to sputter (DC magnetron) a CrxNy layer on Si (100) wafers at varying nitrogen flow rates. The results of the nanoindentation experiments indicate that, over a similar argon and nitrogen regime, the CrxNy films grown in a multi- substrate geometry exhibit higher hardness and elastic modulus on the average than those grown in the confocal geometry. Furthermore, it was found that in the multi-substrate geometry the hardness and elastic modulus of the films were significantly higher than those in the confocally deposited films for a specific regime of the nitrogen flow rate (10-14 sccm). Finally, observations of the mechanical properties trends could be correlated with a higher degree of anisotropic stress for films grown in the multi-substrate in comparison to the confocal geometry.

The Effect of Ta and N Content on Mechanical Properties of DC Magnetron Sputtered fen and Fetan thin films

1996 ◽  
Vol 436 ◽  
Author(s):  
Hong Deng ◽  
M. Kevin Minor ◽  
John A. Barnard
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Young’S Modulus ◽  
Flow Rate ◽  
Young's Modulus ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
N Content ◽  
Hardness Values ◽  
Penetration Depths

AbstractThis paper reports nanoindentation studies of the effect of Ta and N content on the mechanical properties of magnetically soft high moment FeN and FeTaN thin films prepared by dc magnetron sputtering. The FeTaN films were deposited on oxidized silicon (100) substrates with a series of FeTa targets in which the Ta content varies from 0 to 25wt%. The hardness (H) and Young's modulus (E) were measured by the Nano Indenter at nine indenter penetration depths: 20, 30, 40, 50, 60, 80, 100, 120 and 200 nm. The inherent hardness values of these films (no substrate effect) can be determined at penetration depths ranging from 20 to 60 nm for the 500 nm thick film used in the study. It was found that for the films deposited from the pure Fe target when the nitrogen flow rate increases from 0 to about 0.5 sccm the hardness of the film increases. However, a decreasing trend in hardness of these films was observed on further increasing the nitrogen flow rate. On the other hand, for the films prepared from the targets with the Ta content in the range of 5–15wt%, the hardness increases whenever Ta and N contents increase. These effects are clearly illustrated by 3-D and contour hardness and Young's modulus maps in this paper.

Pyrolysis of brown algae (Bifurcaria Bifurcata) in a stainless steel tubular reactor: From a review to a case study

2018 ◽  
Vol 14 (1) ◽  
pp. 31-60 ◽  
Author(s):  
M. Y. Guida ◽  
F. E. Laghchioua ◽  
A. Hannioui
Keyword(s):  
Particle Size ◽  
Stainless Steel ◽  
Flow Rate ◽  
Brown Algae ◽  
Tubular Reactor ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Bifurcaria Bifurcata ◽  
Bio Oil

This article deals with fast pyrolysis of brown algae, such as Bifurcaria Bifurcata at the range of temperature 300–800 °C in a stainless steel tubular reactor. After a literature review on algae and its importance in renewable sector, a case study was done on pyrolysis of brown algae especially, Bifurcaria Bifurcata. The aim was to experimentally investigate how the temperature, the particle size, the nitrogen flow rate (N2) and the heating rate affect bio-oil, bio-char and gaseous products. These parameters were varied in the ranges of 5–50 °C/min, below 0.2–1 mm and 20–200 mL. min–1, respectively. The maximum bio-oil yield of 41.3wt% was obtained at a pyrolysis temperature of 600 °C, particle size between 0.2–0.5 mm, nitrogen flow rate (N2) of 100 mL. min–1 and heating rate of 5 °C/min. Liquid product obtained under the most suitable and optimal condition was characterized by elemental analysis, 1H-NMR, FT-IR and GC-MS. The analysis of bio-oil showed that bio-oil from Bifurcaria Bifurcata could be a potential source of renewable fuel production and value added chemicals.

scholarly journals Structure and Properties of Nanocrystalline (TiZr)xN1−xThin Films Deposited by DC Unbalanced Magnetron Sputtering

2016 ◽  
Vol 2016 ◽  
pp. 1-12 ◽  
Author(s):  
Yu-Wei Lin ◽  
Chia-Wei Lu ◽  
Ge-Ping Yu ◽  
Jia-Hong Huang
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
X Ray Diffraction ◽  
Nitrogen Flow Rate ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

This study aims to investigate the effects of nitrogen flow rate (0–2.5 sccm) on the structure and properties of TiZrN films. Nanocrystalline TiZrN thin films were deposited on Si (001) substrates by unbalanced magnetron sputtering. The major effects of the nitrogen flow rate were on the phase, texture, N/(Ti + Zr) ratio, thickness, hardness, residual stress, and resistivity of the TiZrN films. The nitrogen content played an important role in the phase transition. With increasing nitrogen flow rate, the phase changed from mixed TiZr and TiZrN phases to a single TiZrN phase. The X-ray diffraction results indicated that (111) was the preferred orientation for all TiZrN specimens. The N/(Ti + Zr) ratio of the TiZrN films first increased with increasing nitrogen flow rate and then stabilized when the flow rate further increased. When the nitrogen flow rate increased from 0.4 to 1.0 sccm, the hardness and residual stress of the TiZrN thin film increased, whereas the electrical resistivity decreased. None of the properties of the TiZrN thin films changed with nitrogen flow rate above 1.0 sccm because the films contained a stable single phase (TiZrN). At high nitrogen flow rates (1.0–2.5 sccm), the average hardness and resistivity of the TiZrN thin films were approximately 36 GPa and 36.5 μΩ·cm, respectively.

Influence of the nitrogen flow rate on the order and structure of PECVD boron nitride thin films

2009 ◽  
Vol 355 (31-33) ◽  
pp. 1622-1629 ◽  
Author(s):  
M. Anutgan ◽  
T. Aliyeva Anutgan ◽  
E. Ozkol ◽  
I. Atilgan ◽  
B. Katircioglu
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate
Sign in / Sign up

Export Citation Format

Share Document