High spatial resolution studies of surfaces and small particles using electron beam techniques

2005 ◽  
Vol 143 (2-3) ◽  
pp. 205-218 ◽  
Author(s):  
J.A. Venables ◽  
J. Liu
2000 ◽  
Vol 132 (2-4) ◽  
pp. 113-128 ◽  
Author(s):  
Ian Barkshire ◽  
Peter Karduck ◽  
Werner P. Rehbach ◽  
Silvia Richter

2012 ◽  
Vol 18 (6) ◽  
pp. 1246-1252
Author(s):  
Natasha Erdman ◽  
Charles Nielsen ◽  
Vernon E. Robertson

AbstractPreviously, imaging and analysis with cathodoluminescence (CL) detectors required using high accelerating voltages. Utilization of lower accelerating voltage for microanalysis has the advantages of reduced beam-specimen interaction volume, and thus better spatial resolution, as well as reduction in electron beam induced damage. This article will highlight recent developments in field emission gun–scanning electron microscope technology that have allowed acquisition of high spatial resolution CL images at very low accelerating voltages. The advantages of low kV CL imaging will be shown using examples of a geological specimen (shale) and a specimen of an industrial grade diamond.


1999 ◽  
Vol 588 ◽  
Author(s):  
Takashi Sekiguchi

AbstractWe have developed a cathodoluminescence (CL) system with high spatial resolution using a thermal-field emission gun operating with low electron beam energies. Since the electron range is proportional to the 1.7th power of the electron beam energy, operation with a low energy electron beam strongly reduces the probe size of CL. Luminescence property of ZnO tetrapods was studied with this system. High spatial resolution better than 100 nm was achieved when it was operated with a beam energy less than 3 keV. The variation of CL spectra along one leg of tetrapod was recorded. The ratio of the ultraviolet emission to the visible luminescence at the center of tetrapod was different from those of the points along the arm, suggesting that the center of tetrapod is much defective compared with the arms. We also observed a decrease of CL intensity during observation. Possible degradation mechanisms were discussed.


2017 ◽  
Author(s):  
Zhidong Du ◽  
Ye Wen ◽  
Liang Pan

Massively parallel electron beam lithography may be an alternative manufacturing method in semiconductor industry if the issues of the multi electron beam source are addressed. The microcolumns are suitable for the massively parallel electron beam lithography because of their compactness and the ability to achieve high spatial resolution. A new design with varying apertures for our recent nanoscale photoemission source is presented here. Given the easiness of the fabrication of the microcolumn, we optimized the parameters of the design and found that the resolution can be improved by changing the ratio between the diameters of the focus and extractor electrodes.


1983 ◽  
Vol 31 ◽  
Author(s):  
P. E. Batson ◽  
C. R. M. Grovenor ◽  
D. A. Smith ◽  
C. Wong

ABSTRACTElemental microanalysis, using x-rays and electron energy loss scattering, has been shown to be possible with electron beam probe sizes down to 0.5nm. This paper will discuss some practical problems, such as specimen drift, signal magnitude, and probe-specimen interaction when the probe is made very small. These problems have arisen in two studies: 1) an investigation of as segregation in poly-crystalline Si and 2) imaging of metal spheres with surface and bulk plasmon inelastic scattering.


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