Development of Low Energy Cathodoluminescence System and its Application to the Study of ZnO Powders

1999 ◽  
Vol 588 ◽  
Author(s):  
Takashi Sekiguchi
Keyword(s):  
Electron Beam ◽  
Spatial Resolution ◽  
Beam Energy ◽  
High Spatial Resolution ◽  
Low Energy ◽  
Ultraviolet Emission ◽  
Visible Luminescence ◽  
Probe Size ◽  
Zno Powders ◽  
Better Than

AbstractWe have developed a cathodoluminescence (CL) system with high spatial resolution using a thermal-field emission gun operating with low electron beam energies. Since the electron range is proportional to the 1.7th power of the electron beam energy, operation with a low energy electron beam strongly reduces the probe size of CL. Luminescence property of ZnO tetrapods was studied with this system. High spatial resolution better than 100 nm was achieved when it was operated with a beam energy less than 3 keV. The variation of CL spectra along one leg of tetrapod was recorded. The ratio of the ultraviolet emission to the visible luminescence at the center of tetrapod was different from those of the points along the arm, suggesting that the center of tetrapod is much defective compared with the arms. We also observed a decrease of CL intensity during observation. Possible degradation mechanisms were discussed.

High-Spatial-Resolution Low-Energy Electron Beam X-Ray Microanalysis

2000 ◽  
Vol 132 (2-4) ◽  
pp. 113-128 ◽  
Author(s):  
Ian Barkshire ◽  
Peter Karduck ◽  
Werner P. Rehbach ◽  
Silvia Richter
Keyword(s):  
Electron Beam ◽  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Low Energy ◽  
Energy Electron ◽  
X Ray ◽  
Low Energy Electron

scholarly journals Influence of Beam Energy and Probe Size on the Process of Electron-Beam-Induced Deposition

2006 ◽  
Vol 12 (S02) ◽  
pp. 646-647
Author(s):  
Z-Q Liu ◽  
K Mitsuishi ◽  
K Furuya
Keyword(s):  
Electron Beam ◽  
Beam Energy ◽  
Probe Size ◽  
Electron Beam Induced Deposition

Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006

Comment on low-energy electron-beam energy deposition

1975 ◽  
Vol 22 (4) ◽  
pp. 201-202 ◽  
Author(s):  
W.L. Chadsey ◽  
K.F. Galloway ◽  
R.L. Pease
Keyword(s):  
Electron Beam ◽  
Beam Energy ◽  
Energy Deposition ◽  
Low Energy ◽  
Energy Electron ◽  
Electron Beam Energy ◽  
Low Energy Electron

Applications of high spatial resolution hicroanalysis to materials problems using dedicated STEM

1978 ◽  
Vol 36 (1) ◽  
pp. 418-419
Author(s):  
Ernest L. Hall ◽  
John B. Vander Sande
Keyword(s):  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Profile Analysis ◽  
Scanning Transmission Electron Microscope ◽  
Dramatic Improvement ◽  
X Ray ◽  
Transmission Electron ◽  
Probe Size ◽  
Scanning Transmission ◽  
Compositional Variations

The scanning transmission electron microscope has afforded a dramatic improvement in the spatial resolution of X-ray microanalysis of thin specimens, allowing the investigation of extremely localized compositional variations in materials systems. In this paper, the results of high resolution composition profile analysis in several materials are presented. The materials were analyzed in a 100 kV field emission STEM manufactured by VG Microscopes, Ltd., and fitted with an energy dispersive X-ray spectrometer. The specimens were held in a double-tilt graphite cartridge which allowed X-ray detection in the tilt range 0°-20° about each axis. The vacuum in the specimen chamber was ∿ 2 x 10-9 torr during analysis. Electron probe spot sizes of 5-10 Å were used, corresponding to probe currents in the range of 10-10-10-9 amps.For a given specimen composition, the spatial resolution of X-ray microanalysis in thin specimens is a function of probe size, accelerating voltage, specimen atomic number, and thickness.

Scanning Reflection Electron Microscopy of 2x1 Domain Structure of Si(111) Surface

1985 ◽  
Vol 43 ◽  
pp. 264-265
Author(s):  
H.-J. Ou
Keyword(s):  
Electron Microscopy ◽  
Electron Diffraction ◽  
Spatial Resolution ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Intermediate Energies ◽  
Good Spatial Resolution ◽  
Probe Size ◽  
Reflection Electron Microscopy ◽  
Better Than

Studies of the surface structure of silicon with good spatial resolution made recently by reflection electron microscopy, (REM) have complemented and greatly extended the earlier studies, made by LEED and other methods, of the formation of surface reconstruction superstructures such a the Si(111) 7x7. These studies have not included the 2x1 superstructure on (111) surfaces formed by cleaving Si crystals in ultra-high vacuum. We have now investigated the form of the domains of this 2x1 structure by use of a reconstructed REMEDIE system 2.3 (for Reflection Electron Microscopy and Electron Diffraction at Intermediate Energies, 1-20keV). This system has shown a spatial resolution of better than 100Å although resolutions of about 300Å may be more common in practise because of the limitations due to probe size, vibration and signal noise.

Spatial resolution measurements of electron backscatter diffraction patterns (EBSPs) in the scanning electron microscope

1990 ◽  
Vol 48 (4) ◽  
pp. 404-405 ◽  
Author(s):  
Jarle Hjelen ◽  
Erik Nes
Keyword(s):  
Electron Beam ◽  
Spatial Resolution ◽  
Electron Backscatter Diffraction ◽  
Line Pattern ◽  
Bulk Specimen ◽  
Local Lattice ◽  
Diffraction Patterns ◽  
Backscatter Diffraction ◽  
Stationary Electron ◽  
Better Than

In the EBSP method the stationary electron beam hits a highly tilted bulk specimen in the SEM. The backscattered Bragg diffracted electrons form the Kikuchi line pattern on a phosphor screen. Since the first EBSP experiments were carried out in 1973, this technique has been further developed to determine crystal orientations in connection with texture development in aluminium. Using the EBSP method to calculate local lattice curvatures in heavily deformed aluminium, the spatial resolution has to be better than the selected area channeling pattern (SACP) method.The EBSP resolution (d) was measured by moving the electron beam digitally across grain boundaries in an aluminium sample. The resolution was defined to be the overlapping distance between two diffraction patterns.

Low-energy electron irradiation induced synthesis of molecular nanosheets: influence of the electron beam energy

2021 ◽  
Author(s):  
Christof Neumann ◽  
Richard A. Wilhelm ◽  
Maria Küllmer ◽  
Andrey Turchanin
Keyword(s):  
Electron Beam ◽  
Electron Irradiation ◽  
Beam Energy ◽  
Low Energy ◽  
Energy Electron ◽  
Electron Beam Energy ◽  
Low Energy Electron ◽  
Self Assembled

Electron irradiation induced synthesis of molecular nanosheets from aromatic self-assembled reveals different mechanisms depending on the applied beam energy.

Large Area Electron Beam Enhanced Reactive Etching of SiO2

1987 ◽  
Vol 98 ◽  
Author(s):  
P. Kirk Boyer ◽  
Tim Verhey ◽  
Jorge J. Rocca
Keyword(s):  
Electron Beam ◽  
Beam Energy ◽  
High Pressures ◽  
Beam Current ◽  
Low Energy ◽  
Large Area ◽  
Beam Source ◽  
Energy Beam ◽  
Reactive Gases ◽  
Reactive Gas

ABSTRACTA large area (2.8 cm2) electron beam source has been developed, characterized, and applied to anisotropic etching of SiO2 masked with photoresist. This beam operates at high pressures (up to 100 mTorr), in reactive gases, and at more than 10 mA/cm2. Beam current can be controlled in several ways independently from beam energy. The 100 – 900 eV low energy beam propagates with collimation through several cm of reactive gas, and is believed to minimize space charge defocusing by collisionally ionizing the working gas.

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