Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma

Doo Hyeon Cho; Jae Yong Lee; Jae Sang Choi; Chee Won Chung

doi:10.1016/j.cap.2018.04.022

Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma

Current Applied Physics ◽

10.1016/j.cap.2018.04.022 ◽

2018 ◽

Vol 18 (9) ◽

pp. 968-974 ◽

Cited By ~ 2

Author(s):

Doo Hyeon Cho ◽

Jae Yong Lee ◽

Jae Sang Choi ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

High Density ◽

Nanometer Scale ◽

Density Plasma

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Nanometer-scale etching of copper thin films in high-density plasma of an ethylenediamine/acetic acid/argon gas mixture

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/6.0001592 ◽

2022 ◽

Vol 40 (1) ◽

pp. 010604

Author(s):

Eun Taek Lim ◽

Sung Yong Park ◽

Ji Soo Lee ◽

Seung Hyun Kim ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

Acetic Acid ◽

High Density ◽

Nanometer Scale ◽

Gas Mixture ◽

Argon Gas ◽

Density Plasma

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Nanometer-sized patterning of polysilicon thin films by high density plasma etching

Thin Solid Films ◽

10.1016/j.tsf.2004.03.025 ◽

2004 ◽

Vol 467 (1-2) ◽

pp. 172-175 ◽

Cited By ~ 7

Author(s):

Young Soo Song ◽

Jung Woo Kim ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

Plasma Etching ◽

High Density ◽

Density Plasma

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Nanometer-sized patterning of polysilicon thin films by high density plasma etching using Cl2 and hbr gases

Korean Journal of Chemical Engineering ◽

10.1007/bf02706950 ◽

2003 ◽

Vol 20 (6) ◽

pp. 1138-1141 ◽

Cited By ~ 2

Author(s):

Young Soo Song ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

Plasma Etching ◽

High Density ◽

Density Plasma

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Influence of Etch Gas on High Density Plasma Etching of Polysilicon Thin Films with Nanometer-Size Patterns

Electrochemical and Solid-State Letters ◽

10.1149/1.1626292 ◽

2004 ◽

Vol 7 (1) ◽

pp. G5 ◽

Cited By ~ 2

Author(s):

Young Soo Song ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

Plasma Etching ◽

High Density ◽

Nanometer Size ◽

Density Plasma

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Optical and Mechanical Properties of SiO2 and Nb2O5 Thin Films Deposited by High-Density Plasma Assisted Vapor Deposition

Journal of The Surface Finishing Society of Japan ◽

10.4139/sfj.66.212 ◽

2015 ◽

Vol 66 (5) ◽

pp. 212-218 ◽

Cited By ~ 1

Author(s):

Yasushi MORIIZUMI ◽

Hideo HONMA ◽

Osamu TAKAI

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Vapor Deposition ◽

High Density ◽

Optical And Mechanical Properties ◽

Density Plasma

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Characterization of the high density plasma etching process of CCTO thin films for the fabrication of very high density capacitors

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/8/1/012017 ◽

2010 ◽

Vol 8 ◽

pp. 012017 ◽

Cited By ~ 4

Author(s):

C Altamore ◽

C Tringali ◽

N Sparta' ◽

S Di Marco ◽

A Grasso ◽

...

Keyword(s):

Thin Films ◽

Plasma Etching ◽

High Density ◽

Etching Process ◽

Plasma Etching Process ◽

Very High ◽

Density Plasma

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Etch characteristics of CoZrNb and CoTb magnetic thin films in a high density plasma

phys stat sol (a) ◽

10.1002/pssa.200304581 ◽

2004 ◽

Vol 201 (8) ◽

pp. 1644-1647 ◽

Cited By ~ 7

Author(s):

Byul Shin ◽

Young Soo Song ◽

Sang Jin Park ◽

Tae Wan Kim ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

Magnetic Thin Films ◽

High Density ◽

Density Plasma

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Alkylation of nanoporous silica thin films by high density plasma chemical vapor deposition of a-SiC:H

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1738668 ◽

2004 ◽

Vol 22 (3) ◽

pp. 1067 ◽

Cited By ~ 4

Author(s):

F. M. Pan ◽

B. W. Wu ◽

A. T. Cho ◽

K. C. Tsai ◽

T. G. Tsai ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Nanoporous Silica ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silica Thin Films ◽

Density Plasma

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Etch characteristics of copper thin films in high density plasma of CH4/O2/Ar gas mixture

Thin Solid Films ◽

10.1016/j.tsf.2018.08.046 ◽

2018 ◽

Vol 665 ◽

pp. 51-58 ◽

Cited By ~ 1

Author(s):

Eun Taek Lim ◽

Jin Su Ryu ◽

Chee Won Chung

Keyword(s):

Thin Films ◽

High Density ◽

Gas Mixture ◽

Ar Gas ◽

Density Plasma

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Optical properties and durability performance of substance SiO2/Nb2O5for multilayer thin films prepared by high-density plasma-assisted vapor deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.01aa23 ◽

2015 ◽

Vol 55 (1S) ◽

pp. 01AA23 ◽

Cited By ~ 2

Author(s):

Yasushi Moriizumi ◽

Hideo Honma ◽

Osamu Takai

Keyword(s):

Thin Films ◽

Optical Properties ◽

Vapor Deposition ◽

High Density ◽

Multilayer Thin Films ◽

Durability Performance ◽

Density Plasma

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