Etch characteristics of CoZrNb and CoTb magnetic thin films in a high density plasma

2004 ◽  
Vol 201 (8) ◽  
pp. 1644-1647 ◽  
Author(s):  
Byul Shin ◽  
Young Soo Song ◽  
Sang Jin Park ◽  
Tae Wan Kim ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Magnetic Thin Films ◽  
High Density ◽  
Density Plasma

High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma

2012 ◽  
Vol 521 ◽  
pp. 216-221 ◽  
Author(s):  
Eun Ho Kim ◽  
Tea Young Lee ◽  
Byoung Chul Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
Magnetic Thin Films ◽  
High Density ◽  
Ion Etching ◽  
Ar Plasma ◽  
Density Plasma

Nanometer-sized patterning of polysilicon thin films by high density plasma etching

2004 ◽  
Vol 467 (1-2) ◽  
pp. 172-175 ◽  
Author(s):  
Young Soo Song ◽  
Jung Woo Kim ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Plasma Etching ◽  
High Density ◽  
Density Plasma

Etch characteristics of copper thin films in high density plasma of CH4/O2/Ar gas mixture

2018 ◽  
Vol 665 ◽  
pp. 51-58 ◽  
Author(s):  
Eun Taek Lim ◽  
Jin Su Ryu ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
High Density ◽  
Gas Mixture ◽  
Ar Gas ◽  
Density Plasma
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