Measurements of plasma parameters in capacitively coupled radio frequency plasma from discharge characteristics: Correlation with optical emission spectroscopy

2013 ◽  
Vol 13 (7) ◽  
pp. 1448-1453 ◽  
Author(s):  
B. Bora ◽  
H. Bhuyan ◽  
M. Favre ◽  
E. Wyndham ◽  
H. Chuaqui ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Radio Frequency Plasma ◽  
Plasma Parameters ◽  
Discharge Characteristics ◽  
Capacitively Coupled ◽  
Frequency Plasma

scholarly journals Characterising the Radio Frequency Plasma Source for Glow Discharge Optical Emission Spectroscopy

2002 ◽  
Vol 42 (Suppl) ◽  
pp. S101-S105 ◽  
Author(s):  
Richard Payling ◽  
Patrick Chapon ◽  
Olivier Bonnot ◽  
Philippe Belenguer ◽  
Philippe Guillot ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Source ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

scholarly journals Machine Learning Prediction of Electron Density and Temperature from Optical Emission Spectroscopy in Nitrogen Plasma

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song
Keyword(s):  
Machine Learning ◽  
Electron Temperature ◽  
Real Time ◽  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Plasma Nitridation

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.

scholarly journals Optical Emission Spectra of Oxygen Plasma Produced by Radio-Frequency Plasma

2009 ◽  
Vol 18 (2) ◽  
pp. 102-107
Author(s):  
Do-Yeob Kim ◽  
Min-Su Kim ◽  
Tae-Hoon Kim ◽  
Ghun-Sik Kim ◽  
Hyun-Young Choi ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Oxygen Plasma ◽  
Emission Spectra ◽  
Optical Emission ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Optical Emission Spectra
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