Characterization of radio frequency plasma using Langmuir probe and optical emission spectroscopy

2006 ◽  
Vol 99 (3) ◽  
pp. 033304 ◽  
Author(s):  
M. Nisha ◽  
K. J. Saji ◽  
R. S. Ajimsha ◽  
N. V. Joshy ◽  
M. K. Jayaraj
Keyword(s):  
Radio Frequency ◽  
Langmuir Probe ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

scholarly journals Characterising the Radio Frequency Plasma Source for Glow Discharge Optical Emission Spectroscopy

2002 ◽  
Vol 42 (Suppl) ◽  
pp. S101-S105 ◽  
Author(s):  
Richard Payling ◽  
Patrick Chapon ◽  
Olivier Bonnot ◽  
Philippe Belenguer ◽  
Philippe Guillot ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Source ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

LOW PRESSURE CH2Cl2 PLASMA DISCHARGE

2015 ◽  
Vol 8 (3) ◽  
pp. 2240-2248
Author(s):  
Osvaldo Flores
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Langmuir Probe ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Discharge ◽  
X Ray ◽  
Scanning Electron

Glow discharge of dichloromethane (DCM) was investigated employing Optical Emission Spectroscopy (OES), while the electron temperature and electron density were measured using a double Langmuir probe. Deposits formed were characterized by Scanning Electron Microscopy (SEM), X-ray Photo Fluorescence Spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). The species identified by OES were the molecular bands of C2, C3, CH, H2, CH+, HCl+, Cl and C+. The material deposited displays a growing behavior. SEM observation shows several features which correspond to coalesce and growth mechanism. The characterization of the material deposited can explain the different stages of deposits that are formed on the electrode surface. Several factors are concerned in the complexity of the process, regarding the interaction of species formed during the plasma discharge. Involving several bonds types such as: C=C, C=C-CH2-Cl, C-C and CH.

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