Surface reaction of silicon chlorides during atomic layer deposition of silicon nitride

2018 ◽  
Vol 432 ◽  
pp. 127-131 ◽  
Author(s):  
Luchana L. Yusup ◽  
Jae-Min Park ◽  
Tirta R. Mayangsari ◽  
Young-Kyun Kwon ◽  
Won-Jun Lee
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Surface Reaction ◽  
Atomic Layer ◽  
Layer Deposition

Surface reaction mechanisms for atomic layer deposition of silicon nitride

2004 ◽  
Vol 557 (1-3) ◽  
pp. 159-170 ◽  
Author(s):  
Collin Mui ◽  
Yuniarto Widjaja ◽  
Jeung Ku Kang ◽  
Charles B. Musgrave
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Reaction Mechanisms ◽  
Surface Reaction ◽  
Atomic Layer ◽  
Layer Deposition

Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride

RSC Advances ◽  
2016 ◽  
Vol 6 (72) ◽  
pp. 68515-68524 ◽  
Author(s):  
Luchana L. Yusup ◽  
Jae-Min Park ◽  
Yong-Ho Noh ◽  
Sun-Jae Kim ◽  
Won-Jun Lee ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Surface Sites ◽  
Thermodynamics And Kinetics ◽  
Layer Deposition ◽  
Kinetics Of

The reactivity of surface sites plays a very important role to determine the thermodynamics and kinetics of ALD processes.

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