Ultra-thin silicon oxide layers on crystalline silicon wafers: Comparison of advanced oxidation techniques with respect to chemically abrupt SiO 2 /Si interfaces with low defect densities

2017 ◽  
Vol 395 ◽  
pp. 78-85 ◽  
Author(s):  
Bert Stegemann ◽  
Karim M. Gad ◽  
Patrice Balamou ◽  
Daniel Sixtensson ◽  
Daniel Vössing ◽  
...  
2018 ◽  
Vol 15 (5) ◽  
pp. 056101 ◽  
Author(s):  
P V Borisyuk ◽  
E V Chubunova ◽  
Yu Yu Lebedinskii ◽  
E V Tkalya ◽  
O S Vasilyev ◽  
...  

2014 ◽  
Vol 302 ◽  
pp. 213-215 ◽  
Author(s):  
O.O. Gavrylyuk ◽  
O.Yu. Semchyk ◽  
O.L. Bratus ◽  
A.A. Evtukh ◽  
O.V. Steblova ◽  
...  

Solar Energy ◽  
2019 ◽  
Vol 194 ◽  
pp. 18-26 ◽  
Author(s):  
Zhe Rui ◽  
Yuheng Zeng ◽  
Xueqi Guo ◽  
Qing Yang ◽  
Zhixue Wang ◽  
...  

1974 ◽  
Vol 24 (3) ◽  
pp. 105-107 ◽  
Author(s):  
T. W. Sigmon ◽  
W. K. Chu ◽  
E. Lugujjo ◽  
J. W. Mayer

1985 ◽  
Vol 152-153 ◽  
pp. A162
Author(s):  
J. Finster ◽  
D. Schulze ◽  
F. Bechstedt ◽  
A. Meisel

2005 ◽  
pp. 384
Author(s):  
F. d'Acapito ◽  
S. Mobilio ◽  
A. Terrasi ◽  
S. Scalese ◽  
G. Franz ◽  
...  

1985 ◽  
Vol 152-153 ◽  
pp. 1063-1070 ◽  
Author(s):  
J. Finster ◽  
D. Schulze ◽  
F. Bechstedt ◽  
A. Meisel

1996 ◽  
Vol 68 (1) ◽  
pp. 93-95 ◽  
Author(s):  
Todd G. Ruskell ◽  
Richard K. Workman ◽  
Dong Chen ◽  
Dror Sarid ◽  
Sarah Dahl ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document