Influence of processing parameters on the growth characteristics and ferroelectric properties of sputtered PZT thin films on stainless steel substrates

2013 ◽  
Vol 282 ◽  
pp. 202-210 ◽  
Author(s):  
Ankita Bose ◽  
Monjoy Sreemany ◽  
Sandip Bysakh
Keyword(s):  
Thin Films ◽  
Stainless Steel ◽  
Ferroelectric Properties ◽  
Processing Parameters ◽  
Growth Characteristics ◽  
Pzt Thin Films ◽  
Steel Substrates

scholarly journals Characterization of Chemically Prepared PZT Thin Films

1990 ◽  
Vol 200 ◽  
Author(s):  
Bruce A. Tuttle ◽  
R.W. Schwartz ◽  
D.H. Doughty ◽  
J.A. Voigt ◽  
A.H. Carim
Keyword(s):  
Thin Films ◽  
Heating Rate ◽  
Process Parameters ◽  
Ferroelectric Properties ◽  
Process Variations ◽  
Processing Parameters ◽  
Process Conditions ◽  
Heating Rates ◽  
Pzt Thin Films ◽  
Si Substrates

ABSTRACTWe have systematically varied processing parameters to fabricate PZT 53/47 thin films. Polycrystalline PZT thin films were fabricated by spin depositing Pt coated Sio2/Si substrates with alkoxide solutions. Our study focused on two process parameters: 1) heating rate and 2) excess Pb additions. We used rapid thermal processing techniques to vary heating rates from 3°C/min to 8400°C/min. Films were characterized with the following excess Pb additions: 0, 3, 5, and 10 mol% For all process variations, films with greater perovskite content had better ferroelectric properties. Our best films were fabricated using the following process parameters: an excess Pb addition of 5 mol%, a heating rate of 8400°C/min and annealing conditions of 700°C for 1 min. Films fabricated using these process conditions had a remanent polarization of 0.27 C/m2and a coercive field of 3.4 MV/m.

The Role of Processing Parameters in Variation of Microstruture of Sol-Gel Derived Lead Zirconate Titanate Thin Films

1998 ◽  
Vol 541 ◽  
Author(s):  
Chang Jung Kim ◽  
Tae-Young Kim ◽  
Ilsub Chung ◽  
In Kyung Yoo
Keyword(s):  
Thin Films ◽  
Lead Zirconate Titanate ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Secondary Phase ◽  
Processing Parameters ◽  
Lead Zirconate ◽  
Test System ◽  
Pzt Thin Films ◽  
Force Microscopy

AbstractThe PZT thin films were fabricated to investigate the effect of sol-gel processing parameters on the physical and the electrical properties. The films were made with different amount of excess Pb precursors and drying temperatures, and then annealed in various ambients. The physical properties of the films such as crystallinity and microstructure were evaluated using x-ray diffraction, scanning electron microscopy and atomic force microscopy. The ferroelectric properties and current density characteristics of the films were investigated using a standarized feiroelectric test system and pA meter, respectively. It is found that the drying temperature was playing a key role in the formation of the secondary phase on the PZT thin films. In addition, it turned out that the use of nitrogen as an annealing ambient promoted overall ferroelectric properties, when compared to oxygen ambients.

Characterization of Textured PZT Thin Films Prepared by Sol-gel Method onto Stainless Steel Substrates

2011 ◽  
Vol 1299 ◽  
Author(s):  
Xuelian Zhao ◽  
Xufang Yu ◽  
Shengwen Yu ◽  
Jinrong Cheng
Keyword(s):  
Thin Films ◽  
Stainless Steel ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Buffer Layers ◽  
Sem Images ◽  
Pzt Thin Films ◽  
Gel Method ◽  
Sol Gel Method ◽  
Ss Substrates

ABSTRACTPbZr0.53Ti0.47O3 (PZT) ferroelectric thin films were deposited on LaNiO3 (LNO) buffered stainless steel (SS) substrates by sol-gel method. The effect of LNO buffer layer on the orientation and electric properties of PZT thin films for different thicknesses were studied. X-ray diffraction (XRD) results indicated that PZT thin films on SS substrates exhibit the (100) preferred orientation with the LNO buffer layers. Scanning electron microscope (SEM) images show that PZT thin films were well crystallized with grain size of about 100 nm. PZT thin films deposited on SS maintain the excellent ferroelectric properties with remnant polarization of about 20 μC/cm2.

Preparation of PZT Thin Films on Stainless Steel Using Electrochemical Reduction

1998 ◽  
Vol 136 (2) ◽  
pp. 293-297 ◽  
Author(s):  
Michio Koinuma ◽  
Hideki Ohmura ◽  
Yoshiro Fujioka ◽  
Yasumichi Matsumoto ◽  
Satoshi Yamada
Keyword(s):  
Thin Films ◽  
Stainless Steel ◽  
Electrochemical Reduction ◽  
Pzt Thin Films

The Effect of RuO2/Pt Hybrid Bottom Electrode Structure on The Microstructure and Ferroelectric Properties of Sol-Gel Derived PZT Thin Films

1997 ◽  
Vol 493 ◽  
Author(s):  
Seung-Hyun Kim ◽  
J. G. Hong ◽  
J. C. Gunter ◽  
H. Y. Lee ◽  
S. K. Streiffer ◽  
...  
Keyword(s):  
Thin Films ◽  
Leakage Current ◽  
Bottom Electrode ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Chemical Solution ◽  
Electrode Structure ◽  
Solution Deposition ◽  
Pzt Thin Films ◽  
Chemical Solution Deposition Method

ABSTRACTFerroelectric PZT thin films on thin RuO2 (10, 30, 50nm)/Pt hybrid bottom electrodes were successfully prepared by using a modified chemical solution deposition method. It was observed that the use of a lOnm RuO2Pt bottom electrode reduced leakage current, and gave more reliable capacitors with good microstructure compare to the use of thicker RuO2/Pt bottom electrodes. Typical P-E hysteresis behavior was observed even at an applied voltage of 3V, demonstrating greatly improved remanence and coercivity. Fatigue and breakdown characteristics, measured at 5V, showed stable behavior, and only below 13-15% degradation was observed up to 1010 cycles. Thicker RuO2 layers resulted in high leakage current density due to conducting lead ruthenate or PZT pyrochlore-ruthenate and a rosette-type microstructure.

Post-Processing of Pulsed Laser-Deposited Pzt Thin Films

1991 ◽  
Vol 243 ◽  
Author(s):  
C. K. Chiang ◽  
W. Wong-Ng ◽  
L. P. Cook ◽  
P. K. Schenck ◽  
H. M. Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Material ◽  
Ferroelectric Properties ◽  
Pulsed Laser ◽  
Linear Shrinkage ◽  
Laser Deposition ◽  
Amorphous Films ◽  
Pzt Thin Films ◽  
Si Substrates ◽  
Pzt Thin Film

AbstractPZT thin films were prepared by pulsed laser deposition on unheated Ptcoated Si substrates. As deposited, the films were amorphous. Films crystallized at 550 - 600 °C to produce predominantly crystalline ferroelectric PZT. Crystallization of the amorphous material was accompanied by a linear shrinkage of ∼2 %, as manifested in development of cracks in the film. Spacing, width and morphology of larger cracks followed a regular progression with decreasing film thickness. For film thicknesses less than 500 runm, much of the shrinkage was taken up by small, closely-spaced cracks of local extent. Implications for measurement of PZT thin film ferroelectric properties and processing are discussed.

Growth behavior and ferroelectric properties of Zr-rich PZT thin films deposited on various Pt electrodes

1999 ◽  
Vol 23 (1-4) ◽  
pp. 65-75 ◽  
Author(s):  
Suk-Kyoung Hong ◽  
Yong Eui Lee ◽  
J. Lee ◽  
Hyeong Joon Kim
Keyword(s):  
Thin Films ◽  
Ferroelectric Properties ◽  
Growth Behavior ◽  
Pzt Thin Films ◽  
Pt Electrodes
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