Influence of plasma pressure on the growth characteristics and ferroelectric properties of sputter-deposited PZT thin films

2010 ◽  
Vol 256 (21) ◽  
pp. 6205-6212 ◽  
Author(s):  
A. Bose ◽  
T. Maity ◽  
S. Bysakh ◽  
A. Seal ◽  
Suchitra Sen
Keyword(s):  
Thin Films ◽  
Ferroelectric Properties ◽  
Plasma Pressure ◽  
Growth Characteristics ◽  
Pzt Thin Films ◽  
Sputter Deposited

Issues in the Flexible Integration of Sputter-Deposited PZT Thin Films with Polysilicon and Ti/Pt Electrode Layers for Use as Sensors and Actuators in Microelectromechanical Systems (MEMS)

2000 ◽  
Vol 657 ◽  
Author(s):  
C.F. Knollenberg ◽  
T.D. Sands ◽  
A.S. Nickles ◽  
R.M. White
Keyword(s):  
Thin Films ◽  
Lead Zirconate Titanate ◽  
Microelectromechanical Systems ◽  
Perovskite Phase ◽  
Ferroelectric Properties ◽  
Pt Electrode ◽  
Electrode Layer ◽  
Pzt Thin Films ◽  
Pzt Films ◽  
Sputter Deposited

ABSTRACTSputter-deposited piezoelectric lead zirconate titanate (PZT) thin films with Ti/Pt and polysilicon electrode layers are being investigated for use in Microelectromechanical Systems (MEMS). Existing research shows the nucleation of the perovskite phase of the PZT is linked to the lattice spacing of the underlying Pt electrode and/or seed layers, and is key in obtaining PZT layers with good piezoelectric/ferroelectric properties. Our research with piezoelectric PZT films on Ti/Pt electrode layers aims at employing these films to generate and receive acoustic waves in flexural plate wave devices (FPWs). Our experiments indicate the formation of a random polycrystalline perovskite phase is linked to the emergence of oriented <100> Pt grains within the dominant <111>-oriented crystal structure during rapid thermal annealing in an oxygen environment. Pt films annealed in nitrogen, in contrast, retained their <111> preferential orientation without the formation of Pt <100> grains. PZT films deposited on these electrodes and annealed in nitrogen were strongly oriented in the <111> direction, but exhibited lossy ferroelectric behavior and were prone to delamination. We are also investigating the feasibility of using doped polysilicon electrode layers with PZT thin films. The multiple layers used with the Pt electrode (Pt, Ti, and SiO2 adhesion layer) have significant interactions with one another, and replacing these layers with a single electrode layer should alleviate these complications. A low-temperature PZT deposition process (300°C) and short annealing cycles (30 sec.), coupled with a TiO2 barrier/seed layer should prevent interdiffusion and reactions between the polysilicon and PZT layers. Our experiments show that PZT films deposited and annealed on doped polysilicon layers develop a random polycrystalline perovskite phase, but are subject to tensile cracking. The use of polysilicon as an electrode layer should also facilitate the integration of piezoelectric PZT layers with polysilicon surface micromachined structures using SiGe sacrificial layers.

Dependence of Ferroelectric Properties of SBT Based Capacitors on the Electrode Material

1998 ◽  
Vol 541 ◽  
Author(s):  
S. Tirumala ◽  
S. O. Ryu ◽  
K. B. Lee ◽  
R. Vedula ◽  
S. B. Desu
Keyword(s):  
Thin Films ◽  
Electrode Material ◽  
Electrode Materials ◽  
Perovskite Phase ◽  
Ferroelectric Properties ◽  
Si Substrates ◽  
Non Volatile Memory ◽  
Metal Organic ◽  
Sputter Deposited ◽  
Memory Applications

AbstractThe effect of various electrode materials on the ferroelectric properties of SrBi2Ta2O9 (SBT) thin films has been investigated for non-volatile memory applications. Two sets of electrode structures, viz., Pt-Ir based and Pt-Rh based, were sputter deposited in-situ on Si substrates. SBT thin films were deposited on these electrodes using a metal-organic solution deposition technique followed by a post-deposition anneal at 750 °C in oxygen. Structural characterization revealed a polycrystalline nature with predominant perovskite phase in SBT thin films. Ferroelectric properties were studied in capacitor mode by depositing top electrodes, where the top electrode material is identical to that of the bottom electrode. Extensive analysis of the ferroelectric properties signify the important role played by the electrode material in establishing the device applicability is reported in this work.

The Effect of RuO2/Pt Hybrid Bottom Electrode Structure on The Microstructure and Ferroelectric Properties of Sol-Gel Derived PZT Thin Films

1997 ◽  
Vol 493 ◽  
Author(s):  
Seung-Hyun Kim ◽  
J. G. Hong ◽  
J. C. Gunter ◽  
H. Y. Lee ◽  
S. K. Streiffer ◽  
...  
Keyword(s):  
Thin Films ◽  
Leakage Current ◽  
Bottom Electrode ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Chemical Solution ◽  
Electrode Structure ◽  
Solution Deposition ◽  
Pzt Thin Films ◽  
Chemical Solution Deposition Method

ABSTRACTFerroelectric PZT thin films on thin RuO2 (10, 30, 50nm)/Pt hybrid bottom electrodes were successfully prepared by using a modified chemical solution deposition method. It was observed that the use of a lOnm RuO2Pt bottom electrode reduced leakage current, and gave more reliable capacitors with good microstructure compare to the use of thicker RuO2/Pt bottom electrodes. Typical P-E hysteresis behavior was observed even at an applied voltage of 3V, demonstrating greatly improved remanence and coercivity. Fatigue and breakdown characteristics, measured at 5V, showed stable behavior, and only below 13-15% degradation was observed up to 1010 cycles. Thicker RuO2 layers resulted in high leakage current density due to conducting lead ruthenate or PZT pyrochlore-ruthenate and a rosette-type microstructure.

Post-Processing of Pulsed Laser-Deposited Pzt Thin Films

1991 ◽  
Vol 243 ◽  
Author(s):  
C. K. Chiang ◽  
W. Wong-Ng ◽  
L. P. Cook ◽  
P. K. Schenck ◽  
H. M. Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Material ◽  
Ferroelectric Properties ◽  
Pulsed Laser ◽  
Linear Shrinkage ◽  
Laser Deposition ◽  
Amorphous Films ◽  
Pzt Thin Films ◽  
Si Substrates ◽  
Pzt Thin Film

AbstractPZT thin films were prepared by pulsed laser deposition on unheated Ptcoated Si substrates. As deposited, the films were amorphous. Films crystallized at 550 - 600 °C to produce predominantly crystalline ferroelectric PZT. Crystallization of the amorphous material was accompanied by a linear shrinkage of ∼2 %, as manifested in development of cracks in the film. Spacing, width and morphology of larger cracks followed a regular progression with decreasing film thickness. For film thicknesses less than 500 runm, much of the shrinkage was taken up by small, closely-spaced cracks of local extent. Implications for measurement of PZT thin film ferroelectric properties and processing are discussed.

Growth behavior and ferroelectric properties of Zr-rich PZT thin films deposited on various Pt electrodes

1999 ◽  
Vol 23 (1-4) ◽  
pp. 65-75 ◽  
Author(s):  
Suk-Kyoung Hong ◽  
Yong Eui Lee ◽  
J. Lee ◽  
Hyeong Joon Kim
Keyword(s):  
Thin Films ◽  
Ferroelectric Properties ◽  
Growth Behavior ◽  
Pzt Thin Films ◽  
Pt Electrodes

Irradiation behavior and recovery effect of ferroelectric properties of PZT thin films

2021 ◽  
Author(s):  
Yu Zhao ◽  
Wen-Yue Zhao ◽  
Dan-Dan Ju ◽  
Yue-Yue Yao ◽  
Hao Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Ferroelectric Properties ◽  
Recovery Effect ◽  
Pzt Thin Films ◽  
Irradiation Behavior
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