Ultra low energy SIMS depth profiling of sub-1.5nm silicon oxynitride films

2006 ◽  
Vol 252 (19) ◽  
pp. 7198-7200 ◽  
Author(s):  
C.P.A. Mulcahy ◽  
B. Böck ◽  
P.A. Ebblewhite ◽  
H.P. Hebert ◽  
S. Biswas
Keyword(s):  
Depth Profiling ◽  
Silicon Oxynitride ◽  
Low Energy ◽  
Sims Depth Profiling

Surface roughening and erosion rate change at low energy SIMS depth profiling of silicon during oblique bombardment

2006 ◽  
Vol 253 (5) ◽  
pp. 2662-2670 ◽  
Author(s):  
B. Fares ◽  
B. Gautier ◽  
Ph. Holliger ◽  
N. Baboux ◽  
G. Prudon ◽  
...  
Keyword(s):  
Erosion Rate ◽  
Depth Profiling ◽  
Low Energy ◽  
Rate Change ◽  
Surface Roughening ◽  
Sims Depth Profiling

Boron ultra low energy SIMS depth profiling improved by rotating stage

2006 ◽  
Vol 252 (19) ◽  
pp. 7315-7317 ◽  
Author(s):  
M. Bersani ◽  
D. Giubertoni ◽  
E. Iacob ◽  
M. Barozzi ◽  
S. Pederzoli ◽  
...  
Keyword(s):  
Depth Profiling ◽  
Low Energy ◽  
Sims Depth Profiling

Ultra low energy O2 + SIMS depth profiling of superficial poly(CuPc) and Co(II)T(o-NH2)PP monomolecular layers

2012 ◽  
Vol 45 (1) ◽  
pp. 324-328
Author(s):  
M. G. Dowsett ◽  
R. J. H. Morris ◽  
A. Adriaens ◽  
N. R. Wilson
Keyword(s):  
Depth Profiling ◽  
Low Energy ◽  
Monomolecular Layers ◽  
Sims Depth Profiling

Cesium redeposition artifacts during low energy ToF-SIMS depth profiling

2009 ◽  
Vol 255 (17) ◽  
pp. 7586-7589 ◽  
Author(s):  
R.G. Vitchev ◽  
J. Brison ◽  
L. Houssiau
Keyword(s):  
Depth Profiling ◽  
Low Energy ◽  
Tof Sims ◽  
Sims Depth Profiling
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