Phase detection method with positive-feedback control using a quartz resonator based atomic force microscope in a liquid environment

2004 ◽  
Vol 237 (1-4) ◽  
pp. 650-652 ◽  
Author(s):  
Ryuji Nishi ◽  
Koichi Kitano ◽  
Insook Yi ◽  
Yasuhiro Sugawara ◽  
Seizo Morita
2001 ◽  
Vol 72 (S1) ◽  
pp. S93-S95 ◽  
Author(s):  
R. Nishi ◽  
I. Houda ◽  
K. Kitano ◽  
Y. Sugawara ◽  
S. Morita

Author(s):  
Joo Hoon Choi ◽  
Yangro Lee ◽  
Louis E. DeMarco ◽  
Richard T. Leveille ◽  
Joseph A. Levert ◽  
...  

The feature sizes on Integrated Circuits (ICs) continue to decrease to provide higher device densities and smaller chip designs. To accomplish this, current fabrication and processing technology must be advanced to achieve these goals. In particular, Chemical Mechanical Polishing (CMP), which is used for planarization of wafers and logic circuit components during IC fabrication, can cause severe surface damage to components in the form of delamination or distortion of surface features. CMP utilizes polishing particles suspended between a polymeric pad and the substrate to be polished. To control the process with higher precision the fundamentals of friction between CMP surfaces need to be analyzed. To investigate the friction contributions of the polishing particles in the CMP process, individual CMP abrasive particles are modeled by a silica atomic force microscope (AFM) probe with a radius of curvature on the order of 200 nm that is utilized in a scanning probe microscope (SPM). Lateral forces are measured that occur in simulated polishing of silica substrates and polyurethane pad material in a liquid environment. Results are obtained as a function of pH and environment and are compared with macroscopic friction results obtained using a high precision tribometer with a glass ball.


2014 ◽  
Vol 92 (6) ◽  
pp. 472-483 ◽  
Author(s):  
M. Damircheli ◽  
M.H. Korayem

In an atomic force microscope (AFM), the cantilever vibrates by excitation at a frequency near the fundamental frequency, and the changes in vibration parameters, which result from the nonlinear forces of interaction between sample and cantilever tip, can be used as a tool to reveal the properties of the sample. To properly describe the images acquired by the AFM and to approximate the properties of the investigated sample, it is essential to use analytical and numerical models that can accurately simulate the dynamics of the cantilever and sample. For short beams, the Timoshenko model seems to be very accurate. Considering the fact that short beams (cantilevers) have many applications including the imaging of biological samples in liquid environments, the use of this theory seems to be necessary. In this paper, by employing the Timoshenko beam model, the effect of rotational inertia and shear deformation has been taken into consideration. The interaction forces between sample and cantilever in liquid, ambient air, and vacuum environments are quite different in terms of magnitude and formulation, and they play a significant role in the system’s dynamic response. These forces include hydrodynamic forces, electrostatic double layer force, etc. Using an accurate model for the interaction forces will improve the simulation results significantly. In this paper, the frequency response of the atomic force microscope has been investigated by applying the Timoshenko beam model and considering the forces of interaction between sample and tip in the air and liquid environments. The results indicate that the resonant frequency changes and cantilever vibration amplitude diminishes in a liquid environment compared to the air environment. The simulation results have good agreement with the experimental ones. The frequency responses for the attractive and repulsive regions in the two environments are compared and it is demonstrated that the dynamic response is highly dependent on the hydrodynamic and interaction forces in the liquid medium.


2010 ◽  
Vol 258 ◽  
pp. 012019 ◽  
Author(s):  
Daisuke Inoue ◽  
Nariko Hosomi ◽  
Junko Taniguchi ◽  
Masaru Suzuki ◽  
Makoto Ishikawa ◽  
...  

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