Investigation on the interface of the polycrystalline silicon contacted diode formed with a stacked amorphous silicon film
1992 ◽
Vol 21
(8)
◽
pp. 811-816
◽
2011 ◽
Vol 158
(4)
◽
pp. H374
◽
2011 ◽
Vol 159
(1)
◽
pp. H29-H32
◽
2007 ◽
Vol 46
(3B)
◽
pp. 1245-1249
◽
1987 ◽
Vol 26
(S4)
◽
pp. 47
◽
2019 ◽
Vol 112
◽
pp. 363-367
◽
1992 ◽
Vol 60-61
◽
pp. 29-38
◽
Keyword(s):
2006 ◽
Vol 45
(10A)
◽
pp. 7675-7676
◽
Keyword(s):
Keyword(s):