Shallow junction formation on p-like CdTe crystals by indium diffusion using excimer laser annealing

2001 ◽  
Vol 30 (8) ◽  
pp. 911-916 ◽  
Author(s):  
M. Niraula ◽  
A. Nakamura ◽  
T. Aoki ◽  
H. Tatsuoka ◽  
Y. Hatanaka
Keyword(s):  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Shallow Junction ◽  
Junction Formation ◽  
Indium Diffusion

Excimer Laser annealing for shallow junction formation in Si power MOS devices

2006 ◽  
Vol 504 (1-2) ◽  
pp. 2-6 ◽  
Author(s):  
G. Fortunato ◽  
V. Privitera ◽  
A. La Magna ◽  
L. Mariucci ◽  
M. Cuscunà ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Shallow Junction ◽  
Mos Devices ◽  
Junction Formation

Ultra-Shallow Junction Formation by Plasma doping and Excimer Laser Annealing

2019 ◽  
Vol 19 (1) ◽  
pp. 87-94 ◽  
Author(s):  
Lak-Myung Jung ◽  
Seung-Woo Do ◽  
Jae-Min Kim ◽  
Seong Ho Kong ◽  
Ki-Hong Nam ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Shallow Junction ◽  
Plasma Doping ◽  
Junction Formation

Long-pulse duration excimer laser annealing of Al+ ion implanted 4H-SiC for pn junction formation

2003 ◽  
Vol 208-209 ◽  
pp. 292-297 ◽  
Author(s):  
C. Dutto ◽  
E. Fogarassy ◽  
D. Mathiot ◽  
D. Muller ◽  
P. Kern ◽  
...  
Keyword(s):  
Pulse Duration ◽  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Pn Junction ◽  
Junction Formation ◽  
Long Pulse ◽  
Ion Implanted

Sub-15 nm n[sup +]∕p-Germanium Shallow Junction Formed by PH[sub 3] Plasma Doping and Excimer Laser Annealing

2006 ◽  
Vol 9 (4) ◽  
pp. G136 ◽  
Author(s):  
Sungho Heo ◽  
Sungkweon Baek ◽  
Dongkyu Lee ◽  
Musarrat Hasan ◽  
Hyungsuk Jung ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Shallow Junction ◽  
Plasma Doping
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