Particle generation and film formation in an atmospheric-pressure chemical vapour deposition process using tetraethylorthosilicate

Motoaki Adachi; Kikuo Okuyama; Noboru Tohge

doi:10.1007/bf01178427

Particle generation and film formation in an atmospheric-pressure chemical vapour deposition process using tetraethylorthosilicate

Journal of Materials Science ◽

10.1007/bf01178427 ◽

1995 ◽

Vol 30 (4) ◽

pp. 932-937 ◽

Cited By ~ 16

Author(s):

Motoaki Adachi ◽

Kikuo Okuyama ◽

Noboru Tohge

Keyword(s):

Chemical Vapour Deposition ◽

Atmospheric Pressure ◽

Vapour Deposition ◽

Film Formation ◽

Chemical Vapour ◽

Deposition Process ◽

Particle Generation ◽

Chemical Vapour Deposition Process ◽

Pressure Chemical

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A two-step low pressure chemical vapour deposition process for the production of tungsten metal thin films

Chemical Communications ◽

10.1039/a802202j ◽

1998 ◽

pp. 1447-1448 ◽

Cited By ~ 3

Author(s):

David V. Baxter ◽

Malcolm H. Chisholm ◽

Shiow-Huey Chuang

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Low Pressure ◽

Metal Thin Films ◽

Chemical Vapour Deposition Process ◽

Pressure Chemical ◽

Tungsten Metal

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The effects of deposition and test conditions on nanomechanical behaviour of ultrathin films produced by plasma-enhanced chemical vapour deposition process at atmospheric pressure

Thin Solid Films ◽

10.1016/j.tsf.2004.02.050 ◽

2004 ◽

Vol 466 (1-2) ◽

pp. 158-166 ◽

Cited By ~ 9

Author(s):

Zygmunt Rymuza ◽

Maciej Misiak ◽

Zenobia Rzanek-Boroch ◽

Krzysztof Schmidt-Szałowski ◽

Jadwiga Janowska

Keyword(s):

Chemical Vapour Deposition ◽

Ultrathin Films ◽

Atmospheric Pressure ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Chemical Vapour Deposition Process ◽

Test Conditions

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Deposition of surface layers by the low-pressure chemical vapour deposition process conducted in a TiCl4+H2 atmosphere: contribution of the nitrogen contained in the Armco iron substrate

Journal of Materials Science Letters ◽

10.1007/bf00506345 ◽

1993 ◽

Vol 12 (16) ◽

pp. 1302-1305

Author(s):

J. Michalski

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Armco Iron ◽

Chemical Vapour ◽

Deposition Process ◽

Low Pressure ◽

Surface Layers ◽

Chemical Vapour Deposition Process ◽

Pressure Chemical

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Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:2001324 ◽

2001 ◽

Vol 11 (PR3) ◽

pp. Pr3-189-Pr3-196

Author(s):

L. Zambov ◽

B. Caussat ◽

R. Boubeker ◽

J.-P. Couderc

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Film Formation ◽

Chemical Vapour ◽

Low Pressure ◽

Pressure Chemical ◽

Kinetics Of

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A general model of the chemical vapour deposition process II: Experimental verification for some particular cases

Surface Technology ◽

10.1016/0376-4583(80)90033-3 ◽

1980 ◽

Vol 10 (6) ◽

pp. 455-480 ◽

Cited By ~ 2

Author(s):

Jacek Korec

Keyword(s):

Chemical Vapour Deposition ◽

Experimental Verification ◽

General Model ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Chemical Vapour Deposition Process

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Vanadium(IV) oxide thin films on glass and silicon from the atmospheric pressure chemical vapour deposition reaction of VOCl3 and water

Polyhedron ◽

10.1016/j.poly.2004.09.020 ◽

2004 ◽

Vol 23 (18) ◽

pp. 3087-3095 ◽

Cited By ~ 58

Author(s):

Troy D. Manning ◽

Ivan P. Parkin

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Atmospheric Pressure ◽

Vapour Deposition ◽

Chemical Vapour ◽

Oxide Thin Films ◽

Pressure Chemical

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Atmospheric Pressure Chemical Vapour Deposition of NbSe2 Thin Films on Glass

European Journal of Inorganic Chemistry ◽

10.1002/ejic.200500857 ◽

2006 ◽

Vol 2006 (6) ◽

pp. 1255-1259 ◽

Cited By ~ 34

Author(s):

Nicolas D. Boscher ◽

Claire J. Carmalt ◽

Ivan P. Parkin

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Atmospheric Pressure ◽

Vapour Deposition ◽

Chemical Vapour ◽

Pressure Chemical

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Modeling of non-stoichiometric silicon oxides obtained by plasma enhanced chemical vapour deposition process

Thin Solid Films ◽

10.1016/j.tsf.2006.09.032 ◽

2007 ◽

Vol 515 (7-8) ◽

pp. 3380-3386 ◽

Cited By ~ 6

Author(s):

M. Riera ◽

J.A. Rodríguez ◽

J. Barreto ◽

C. Domínguez

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Silicon Oxides ◽

Chemical Vapour Deposition Process

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The mechanism of interaction between Cl-containing gaseous phase and cemented carbides in the chemical vapour deposition process

Thin Solid Films ◽

10.1016/0040-6090(94)90757-9 ◽

1994 ◽

Vol 249 (2) ◽

pp. 174-182 ◽

Cited By ~ 7

Author(s):

I.Yu Konyashin

Keyword(s):

Chemical Vapour Deposition ◽

Gaseous Phase ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Cemented Carbides ◽

Chemical Vapour Deposition Process ◽

Mechanism Of Interaction

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Atmospheric pressure chemical vapour deposition of fluorine-doped tin(IV) oxide from fluoroalkyltin precursors

Applied Organometallic Chemistry ◽

10.1002/aoc.721 ◽

2005 ◽

Vol 19 (5) ◽

pp. 644-657 ◽

Cited By ~ 8

Author(s):

Joanne E. Stanley ◽

Anthony C. Swain ◽

Kieran C. Molloy ◽

David W. H. Rankin ◽

Heather E. Robertson ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Atmospheric Pressure ◽

Vapour Deposition ◽

Chemical Vapour ◽

Pressure Chemical

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