Deposition of surface layers by the low-pressure chemical vapour deposition process conducted in a TiCl4+H2 atmosphere: contribution of the nitrogen contained in the Armco iron substrate
2002 ◽
Vol 82
(1)
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pp. 137-165
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1999 ◽
Vol 09
(PR8)
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pp. Pr8-395-Pr8-402
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2001 ◽
Vol 11
(PR3)
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pp. Pr3-189-Pr3-196
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2001 ◽
Vol 231
(1-2)
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pp. 242-247
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2003 ◽
Vol 93
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pp. 453-458
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Keyword(s):