Application of PAC to study equilibrium point defects in intermetallic compounds

1993 ◽  
Vol 80 (1-4) ◽  
pp. 1257-1261 ◽  
Author(s):  
Gary S. Collins ◽  
Jiawen Fan
1993 ◽  
Vol 48 (9) ◽  
pp. 6712-6715 ◽  
Author(s):  
C. L. Fu ◽  
Y.-Y. Ye ◽  
M. H. Yoo ◽  
K. M. Ho

2001 ◽  
Vol 194-199 ◽  
pp. 357-362 ◽  
Author(s):  
S. Zaroual ◽  
O. Sassi ◽  
J. Aride ◽  
Jean Bernardini ◽  
Gérard Moya

MRS Bulletin ◽  
1991 ◽  
Vol 16 (12) ◽  
pp. 18-21
Author(s):  
David Seidman ◽  
Donglu Shi

This issue of the MRS Bulletin follows up on the November issue's five articles on point defect phenomena in a wide range of materials with five more articles on point defects. The present articles emphasize the behavior of different phenomena in various materials—nonstoichiometric metal oxides, intermetallic compounds, type II superconductors and semiconductors—in terms of fundamental properties of point defects. Again, point defects is the unifying theme but the emphasis shifts to material behavior.This issue begins with Marshall Stoneham's article on the roles theory plays in predicting and understanding material behavior in terms of point defects in the different classes of materials. The following article by Rüdiger Dieckmann discusses the relationships between point defect concentrations in nonstoichiometric metal oxides and diffusion, i.e., mass transport. Next, Georges Martin and Pascal Bellon review their new approach for analyzing the role played by antisite defects in nonequilibrium phase transitions in intermetallic compounds. Then, Donglu Shi focuses on the effect of point, line, and planar defects on three major properties of type II superconductors—the critical transition temperature, the upper critical magnetic field, and the critical current density. Finally, Lionel Kimerling shows how defect engineering is used to achieve a high degree of complexity in product fabrication and greater sophistication in product performance; he illustrates what he means by defect engineering with examples from basic processes used in electronic materials processing.


1993 ◽  
Vol 79 (1-4) ◽  
pp. 745-748 ◽  
Author(s):  
Jiawen Fan ◽  
Gary S. Collins

2003 ◽  
Vol 94 (9) ◽  
pp. 954-961 ◽  
Author(s):  
J. Breuer ◽  
F. Sommer ◽  
E. J. Mittemeijer

1986 ◽  
Vol 1 (3) ◽  
pp. 425-441 ◽  
Author(s):  
D.F. Pedraza

A buildup of radiation-induced lattice defects is proposed as the cause for lattice instability that can give rise to a crystalline-to-amorphous transition. An analysis of published experiments on intermetallic compounds suggests that, when amorphization takes place, no microstructural evolution based on the aggregation of like-point defects occurs. This observation leads us to suggest that buildup of a different type of defect, which will destabilize the crystal, should occur. We thus propose that an interstitial and a vacancy may form a complex, giving rise to a relaxed configuration exhibiting a sort of short-range order. Two mechanisms of complex formation are analyzed, one diffusionless (limited by the point defect production rate) and the other temperature dependent. The amorphization kinetics as a function of temperature, dose, and point defect sink strength are studied. Theoretical predictions on the amorphization dose as a function of temperature are made for the equiatomic TiNi alloy and compared with available experimental results.


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