Enhanced disordering of GaAs/AIGaAs multiple quantum well by rapid thermal annealing using plasma enhanced chemical vapour deposited SiN capping layer grown at high RF power condition
1994 ◽
Vol 13
(5)
◽
pp. 326-328
◽
Keyword(s):
Rf Power
◽
1995 ◽
Vol 14
(20)
◽
pp. 1433-1435
◽
Keyword(s):
2006 ◽
Vol 23
(1)
◽
pp. 256-258
◽
2018 ◽
Vol 439
◽
pp. 1127-1132
◽
1994 ◽
Vol 136
(1-4)
◽
pp. 56-63
◽
2003 ◽
Vol 18
(2)
◽
pp. 170-173
◽