A multi-technique study of the surface preparation of InSb substrate and subsequently grown CdTe films by molecular beam epitaxy

Author(s):  
Z.C. Feng ◽  
H. Gong ◽  
W.J. Choyke ◽  
N.J. Doyle ◽  
R.F.C. Farrow
1988 ◽  
Vol 6 (4) ◽  
pp. 2821-2825 ◽  
Author(s):  
S. Hwang ◽  
R. L. Harper ◽  
K. A. Harris ◽  
N. C. Giles ◽  
R. N. Bicknell ◽  
...  

2010 ◽  
Vol 46 (7) ◽  
pp. 693-702
Author(s):  
S. A. Denisov ◽  
V. Yu. Chalkov ◽  
V. G. Shengurov ◽  
S. P. Svetlov ◽  
D. A. Pavlov ◽  
...  

1989 ◽  
Vol 159 ◽  
Author(s):  
R. T. Tung ◽  
F. Schrey ◽  
D. J. Eaglesham

ABSTRACTLine defects at the interfaces of epitaxial silicide layers grown at room temperature on Si(111) are found to correspond to steps on the original surface. This has enabled the examination, by transmission electron microscopy, of the topography of large areas of the Si surface after various treatments. Methods for removal of surface oxide and carbide are compared. Silicon molecular beam epitaxy (MBE) is shown to occur via step-flow mechanism at high temperatures, and through nucleation and growth of islands on terraces at low temperatures.


2015 ◽  
Vol 413 ◽  
pp. 17-24 ◽  
Author(s):  
K. Madiomanana ◽  
M. Bahri ◽  
J.B. Rodriguez ◽  
L. Largeau ◽  
L. Cerutti ◽  
...  

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