Electron probe microanalysis (EPMA) measurement of aluminum oxide film thickness in the nanometer range on aluminum sheets

2005 ◽  
Vol 34 (2) ◽  
pp. 92-95 ◽  
Author(s):  
Yoshio Osada
Keyword(s):  
Oxide Film ◽  
Aluminum Oxide ◽  
Film Thickness ◽  
Electron Probe Microanalysis ◽  
Electron Probe ◽  
Nanometer Range ◽  
Aluminum Oxide Film ◽  
Aluminum Sheets ◽  
Oxide Film Thickness ◽  
Epma Measurement

Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range

2002 ◽  
Vol 374 (4) ◽  
pp. 631-634 ◽  
Author(s):  
Procop M. ◽  
Radtke M. ◽  
Krumrey M. ◽  
Hasche K. ◽  
Schädlich S. ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Electron Probe Microanalysis ◽  
Electron Probe ◽  
Thin Film Thickness ◽  
Epma Measurement

Electron Probe Measurements of Oxide Film Thickness on Silicon Surfaces

2015 ◽  
Vol 58 (9) ◽  
pp. 953-957 ◽  
Author(s):  
V. P. Gavrilenko ◽  
A. Yu. Kuzin ◽  
V. B. Mityukhlyaev ◽  
M. A. Stepovich ◽  
P. A. Todua ◽  
...  
Keyword(s):  
Oxide Film ◽  
Film Thickness ◽  
Electron Probe ◽  
Silicon Surfaces ◽  
Oxide Film Thickness ◽  
Probe Measurements

scholarly journals Photoluminescence of ion-synthesized 9R-Si inclusions in SiO2/Si structure: Effect of irradiation dose and oxide film thickness

2021 ◽  
Vol 118 (21) ◽  
pp. 212101
Author(s):  
Alena Nikolskaya ◽  
Alexey Belov ◽  
Alexey Mikhaylov ◽  
Anton Konakov ◽  
David Tetelbaum ◽  
...  
Keyword(s):  
Oxide Film ◽  
Film Thickness ◽  
Irradiation Dose ◽  
Structure Effect ◽  
Oxide Film Thickness

Fabrication of Anodic Aluminum Oxide Film on Large-Area Glass Substrate

2007 ◽  
Vol 10 (12) ◽  
pp. C69 ◽  
Author(s):  
Ching-Jung Yang ◽  
Shih-Wei Liang ◽  
Pu-Wei Wu ◽  
Chih Chen ◽  
Jia-Min Shieh
Keyword(s):  
Oxide Film ◽  
Aluminum Oxide ◽  
Glass Substrate ◽  
Anodic Aluminum Oxide ◽  
Large Area ◽  
Anodic Aluminum Oxide Film ◽  
Aluminum Oxide Film ◽  
Anodic Aluminum

Strength and Adhesion of Thin Aluminum Oxide Film Deposited on Iron Surface

1993 ◽  
Vol 115 (4) ◽  
pp. 615-619 ◽  
Author(s):  
M. Nakanishi ◽  
H. Okuya ◽  
K. Nakajima
Keyword(s):  
Oxide Film ◽  
Aluminum Oxide ◽  
Substrate Surface ◽  
Iron Surface ◽  
Indentation Hardness ◽  
Aluminum Oxide Film ◽  
Thin Aluminum ◽  
Atomic Mixing ◽  
Scratch Tests ◽  
Sputter Etching

The strength of deposited film and the adhesion between the film and the substrate were investigated with deposited aluminum oxide film on iron surface by scratching the surface with a diamond cone. Two types of samples were examined, one with oxide film deposited after cleaning the substrate surface by sputter etching, the other with the film deposited without any sputter etching. It was found that a law similar to Meyers’ for indentation hardness holds between the load and scratch width on the sample examined. These results suggest that by analyzing the scratch data the adhesion strength of the film to the substrate can be estimated together with the hardness of the film itself. Analyses by EPMA (electron probe X-ray microanalyzer) and AES (Auger electron spectroscopy) were conducted to correlate the results obtained by the scratch tests and friction experiments, and it was confirmed that (i) adhesion is improved by sputter etching prior to the deposition of the film; (ii) adhesion decreases considerably due to the progress of oxidation in the vicinity of the interface, which depends markedly on the oxygen concentration in the oxide film; and (iii) there is an optimum thickness of the three-component layer (Fe, Al, and O) formed by atomic mixing at the interface for maximizing the adhesion.

Structure of the Ultrathin Aluminum Oxide Film on NiAl(110)

Science ◽  
2005 ◽  
Vol 308 (5727) ◽  
pp. 1440-1442 ◽  
Author(s):  
G. Kresse
Keyword(s):  
Oxide Film ◽  
Aluminum Oxide ◽  
Aluminum Oxide Film
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